UNI OPTICS(Fujian) Co., Ltd UV Fused Silica

Description
Fused Silica is formed by chemical combination of silicon and oxygen. Fused Silica is perfect optical material due to its good UV and IR transmission, low coefficient of thermal expansion. It has high stability and resistance to thermal shock over large temperature excursions, wide temperature operating range and high laser damage threshold.
Description
Fused Silica is formed by chemical combination of silicon and oxygen. Fused Silica is perfect optical material due to its good UV and IR transmission, low coefficient of thermal expansion. It has high stability and resistance to thermal shock over large temperature excursions, wide temperature operating range and high laser damage threshold.

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UV Fused Silica -  - UNI OPTICS(Fujian) Co., Ltd
Fuzhou, China
UV Fused Silica
UV Fused Silica
Fused Silica is formed by chemical combination of silicon and oxygen. Fused Silica is perfect optical material due to its good UV and IR transmission, low coefficient of thermal expansion. It has high stability and resistance to thermal shock over large temperature excursions, wide temperature operating range and high laser damage threshold.

Fused Silica is formed by chemical combination of silicon and oxygen. Fused Silica is perfect optical material due to its good UV and IR transmission, low coefficient of thermal expansion. It has high stability and resistance to thermal shock over large temperature excursions, wide temperature operating range and high laser damage threshold.

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Technical Specifications

  UNI OPTICS(Fujian) Co., Ltd
Product Category Optical Crystals
Product Name UV Fused Silica
Optical Application Ultraviolet
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