A highly effective negative tone photoresist remover used mainly for TSV mask and solder bumping applications. Developed to address laminated photo-resins and liquid resins, the novel stripping formulation of this TMAH/DMSO chemistry exhibits high dissolution performance compared to standard TMAH based blends.
TechniStrip® NF52 provides full dissolution of most photoresist without the use of harmful products such as NMP and Hydroxylamine. NF52 successfully performs without any negative impact to the copper surface, preserving critical fine features that would otherwise be negatively impacted by photoresist strippers that can etch into fine surface details.
| Technic, Inc. | |
|---|---|
| Product Category | Cleaning Agents and Surface Treatments |
| Product Number | TechniStrip® NF52 |
| Product Name | Photoresist Stripper |
| Type | Paint, Sealant or Adhesive Remover; Cleaner |
