SynSysCo HD Series Hybrid Dual-Helical Dry Pump HD1200

Description
HD Series Pumps World Class CoO for Harsh Applications HD Series Pumps are application proven pumps providing world class energy efficiency, low CoO, and excellent reliability. HD series are a good selection for PECVD and LPCD applications involving corrosive, condensable and particulate by-products. They are very compact, quiet and have state-of-the-art network, control and feedback capabilities. Recommended Applications: Diffusion Furnaces, PECVD, a-Si / u-Si deposition, Etch, LPCVD Pumping Capacities: 120 m³/hr to 1,000 m³/hr (70-588 cfm)
Description
HD Series Pumps World Class CoO for Harsh Applications HD Series Pumps are application proven pumps providing world class energy efficiency, low CoO, and excellent reliability. HD series are a good selection for PECVD and LPCD applications involving corrosive, condensable and particulate by-products. They are very compact, quiet and have state-of-the-art network, control and feedback capabilities. Recommended Applications: Diffusion Furnaces, PECVD, a-Si / u-Si deposition, Etch, LPCVD Pumping Capacities: 120 m³/hr to 1,000 m³/hr (70-588 cfm)

Suppliers

Company
Product
Description
Supplier Links
HD Series Hybrid Dual-Helical Dry Pump - HD1200 - SynSysCo
Montrose, CO, USA
HD Series Hybrid Dual-Helical Dry Pump
HD1200
HD Series Hybrid Dual-Helical Dry Pump HD1200
HD Series Pumps World Class CoO for Harsh Applications HD Series Pumps are application proven pumps providing world class energy efficiency, low CoO, and excellent reliability. HD series are a good selection for PECVD and LPCD applications involving corrosive, condensable and particulate by-products. They are very compact, quiet and have state-of-the-art network, control and feedback capabilities. Recommended Applications: Diffusion Furnaces, PECVD, a-Si / u-Si deposition, Etch, LPCVD Pumping Capacities: 120 m³/hr to 1,000 m³/hr (70-588 cfm)

HD Series Pumps

World Class CoO for Harsh Applications

HD Series Pumps are application proven pumps providing world class energy efficiency, low CoO, and excellent reliability. HD series are a good selection for PECVD and LPCD applications involving corrosive, condensable and particulate by-products. They are very compact, quiet and have state-of-the-art network, control and feedback capabilities.

  • Recommended Applications: Diffusion Furnaces, PECVD, a-Si / u-Si deposition, Etch, LPCVD
  • Pumping Capacities: 120 m³/hr to 1,000 m³/hr (70-588 cfm)
Supplier's Site

Technical Specifications

  SynSysCo
Product Category Vacuum Pumps and Vacuum Generators
Product Number HD1200
Product Name HD Series Hybrid Dual-Helical Dry Pump
Vacuum Pump Type Mechanical
Configuration Individual Vacuum Pump
Application Industrial; Semiconductor; CVD, PVD, Etch, High Particulate, High Water Vapor Vacuum Ovens, Heat Treating, Lamination
Pumping Speed 588 CFM (1000 m³/hr)
Ultimate Vacuum 5.00E-4 torr (29.9 in Hg vac)
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