Based on our popular BT-1, it shares the same robust and reliable characteristics while providing yet another example of Plasma Etch surface modification innovation. The large all aluminum chamber accommodates a generously sized circular, rotating active processing surface has the option of insulated or direct on electrode method of treatment.
| Plasma Etch, Inc. | |
|---|---|
| Product Category | Thin Film Equipment |
| Product Number | TT-1 |
| Product Name | Turn Table Plasma Etcher |
| Type | Free Standing System |
| Process | Plasma Etching and Cleaning |
| Applications | Research / Surface Analysis; Printed Circuit Boards |
| Materials Processed | Tungsten; Metal; Gallium Arsenide or Compound Semiconductors; Precious Metals |
