Built as an extension of our MK-II platform, it offers you the same repeatability, reliability and long life, as well as low maintenance costs. The Reactive Ion Etch (RIE) electrode offers the highest directional plasma effect.
Etching with our roll to roll plasma etcher in the large all aluminum chambers accommodate a generously sized active processing surface located between the feed and take up spools.
| Plasma Etch, Inc. | |
|---|---|
| Product Category | Thin Film Equipment |
| Product Number | PE-2000R |
| Product Name | Roll to Roll / Reel to Reel Plasma Etcher |
| Process | Plasma Etching and Cleaning |
| Applications | Research / Surface Analysis; Printed Circuit Boards |
| Materials Processed | Tungsten; Metal; Gallium Arsenide or Compound Semiconductors; Precious Metals |
