The all aluminum chamber features over 240 square inches of active processing surface with the three level standard configuration. The clean design features an industrial powder coated frame to guard your processing environment from contamination.
| Plasma Etch, Inc. | |
|---|---|
| Product Category | Thin Film Equipment |
| Product Number | PE-100 |
| Product Name | Benchtop Plasma Cleaner |
| Type | Laboratory or Benchtop |
| Process | Plasma Etching and Cleaning |
| Applications | Research / Surface Analysis; Printed Circuit Boards |
| Materials Processed | Tungsten; Metal; Gallium Arsenide or Compound Semiconductors; Precious Metals |
