Plasma Etch, Inc. High Production Plasma System MK-III

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High Production Plasma System - MK-III - Plasma Etch, Inc.
Carson City, NV, USA
High Production Plasma System MK-III
The generous aluminum chambers accommodates a properly sized active processing surface with our standard configurations having dual bays as few as 6 or as many as 24 plasma processing levels, each 24” by 18.” Our oxygen service vacuum pump and booster is equipped with a two point purge system to minimize any corrosive end products forming in the pump thereby extending the service life while lowering maintenance costs

Technical Specifications

  Plasma Etch, Inc.
Product Category Thin Film Equipment
Product Number MK-III
Product Name High Production Plasma System
Materials Processed Tungsten; Metal; Gallium Arsenide or Compound Semiconductors; Precious Metals
Type Free Standing System
Applications Research / Surface Analysis; Printed Circuit Boards
Facilities Required AC Service; 120/208 VAC, 50/60 Hz
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