Gelest, Inc. DIMETHYLSILANE SID4230.0

Additional Properties Hydrolytic Sensitivity 3: reacts with aqueous base Application Generates cubic silicon carbide by plasma CVD.1 Epitaxial growth of cubic silicon carbide carried out by triode plasma CVD.2 Reference 1. Hashim, A. et al. Semiconductor Electronics, IEE Int'l. Conf. Proc. 2006, 646. 2. Yasuiet, K. et al. Appl. Surf. Sci. 2000, 159, 556. Safety Packaging Under Nitrogen Dialkyl Silane Reducing Agent Organosilanes are hydrocarbon-like and possess the ability to serve as both ionic and free-radical reducing agents. These reagents and their reaction by-products are safer and more easily handled and disposed than many other reducing agents. The metallic nature of silicon and its low electronegativity relative to hydrogen lead to polarization of the Si-H bond yielding a hydridic hydrogen and a milder reducing agent compared to aluminum-, boron-, and other metal-based hydrides. A summary of some key silane reductions are presented in Table 1 of the Silicon-Based Reducing Agents brochure. Volatile Carbosilane Carbosilanes are compounds in which the elements of silicon and carbon alternate in a molecular framework or polymeric backbone in an approximate ratio of 1:1. By appropriate selection of the carbosilane precursor and deposition conditions the silicon carbide framework can be shifted toward substituted silicon and diamond-like structures. Dimethylsilane; Dimethylsilyldihydri de; 2MS ΔHcomb: -2,612 kJ/mol ΔHform: -96 kJ/mol ΔHvap: 23.0 kJ/mol Dipole moment: 0.75 debye Vapor pressure, -80 °C: 30 mm CVD precursor for low k dielectric layers in damascene metallization applications Generates cubic silicon carbide by plasma CVD Epitaxial growth of cubic silicon carbide carried out by triode plasma CVD Very low boiling point silane that is a gas at atmospheric conditions Extensive review of silicon based reducing agents: Larson, G.; Fry, J. L. "Ionic and Organometallic-Catal yzed Organosilane Reductions", Wipf, P., Ed.; Wiley, 2007