Used for generating moderate concentrations of high vapor pressure compounds such as SO2, H2S, NH3, and Cl2, and for generating very low concentrations of low vapor pressure compounds such as benzene, acrolein, and water. Typical emission rate is 1 to 5 ppm, depending on the compound and the operating temperature.
| Kin-Tek Laboratories Inc. | |
|---|---|
| Product Category | Industrial Gases |
| Product Number | Trace Source ELSRT - Cl2H2Si H2Cl2Si |
| Product Name | Disposable Permeation Tube |
| Industrial Gases | Silicon-based; Dichlorosilane |
