Used for generating moderate concentrations of high vapor pressure compounds such as SO2, H2S, NH3, and Cl2, and for generating very low concentrations of low vapor pressure compounds such as benzene, acrolein, and water. Typical emission rate is 1 to 5 ppm, depending on the compound and the operating temperature.
Used for generating moderate concentrations of high vapor pressure compounds such as SO2, H2S, NH3, and Cl2, and for generating very low concentrations of low vapor pressure compounds such as benzene, acrolein, and water. Typical emission rate is 1 to 5 ppm, depending on the compound and the operating temperature.
Used for generating moderate concentrations of high vapor pressure compounds such as SO2, H2S, NH3, and Cl2, and for generating very low concentrations of low vapor pressure compounds such as benzene, acrolein, and water. Typical emission rate is 1 to 5 ppm, depending on the compound and the operating temperature.
| Kin-Tek Laboratories Inc. | Kin-Tek Laboratories Inc. | Kin-Tek Laboratories Inc. | |
|---|---|---|---|
| Product Category | Industrial Gases | Industrial Gases | Industrial Gases |
| Product Number | Trace Source™ ELSRT - C4H10O | Trace Source™ ELSRT - C4H10O | Trace Source™ ELSRT - C4H10O |
| Product Name | Disposable Permeation Tube | Disposable Permeation Tube | Disposable Permeation Tube |
| Industrial Gases | n-Butanol | Diethyl ether | sec-Butanol |
