Kin-Tek Laboratories Inc. Disposable Permeation Tube Trace Source™ ELSRT - C2H3Cl2F

Description
Used for generating moderate concentrations of high vapor pressure compounds such as SO2, H2S, NH3, and Cl2, and for generating very low concentrations of low vapor pressure compounds such as benzene, acrolein, and water. Typical emission rate is 1 to 5 ppm, depending on the compound and the operating temperature.
Description
Used for generating moderate concentrations of high vapor pressure compounds such as SO2, H2S, NH3, and Cl2, and for generating very low concentrations of low vapor pressure compounds such as benzene, acrolein, and water. Typical emission rate is 1 to 5 ppm, depending on the compound and the operating temperature.

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Disposable Permeation Tube - Trace Source™ ELSRT - C2H3Cl2F - Kin-Tek Laboratories Inc.
La Marque, TX, USA
Disposable Permeation Tube
Trace Source™ ELSRT - C2H3Cl2F
Disposable Permeation Tube Trace Source™ ELSRT - C2H3Cl2F
Used for generating moderate concentrations of high vapor pressure compounds such as SO2, H2S, NH3, and Cl2, and for generating very low concentrations of low vapor pressure compounds such as benzene, acrolein, and water. Typical emission rate is 1 to 5 ppm, depending on the compound and the operating temperature.

Used for generating moderate concentrations of high vapor pressure compounds such as SO2, H2S, NH3, and Cl2, and for generating very low concentrations of low vapor pressure compounds such as benzene, acrolein, and water. Typical emission rate is 1 to 5 ppm, depending on the compound and the operating temperature.

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Technical Specifications

  Kin-Tek Laboratories Inc.
Product Category Industrial Gases
Product Number Trace Source™ ELSRT - C2H3Cl2F
Product Name Disposable Permeation Tube
Industrial Gases 1,1,1-Dichlorofluoroethane
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