Kin-Tek Laboratories Inc. Disposable Permeation Tube Trace Source ELSRT-2 - Cl2H2Si H2Cl2Si

Description
Used for generating low to moderate concentrations of high vapor pressure compounds such as Cl2, NO2, and NH3. Typical emission rate is sub-ppm to 2.5 ppm, depending on the compound and the operating temperature. This type of tube is also used for field service where higher operating temperatures may be required.
Description
Used for generating low to moderate concentrations of high vapor pressure compounds such as Cl2, NO2, and NH3. Typical emission rate is sub-ppm to 2.5 ppm, depending on the compound and the operating temperature. This type of tube is also used for field service where higher operating temperatures may be required.

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Disposable Permeation Tube - Trace Source ELSRT-2 - Cl2H2Si H2Cl2Si - Kin-Tek Laboratories Inc.
La Marque, TX, USA
Disposable Permeation Tube
Trace Source ELSRT-2 - Cl2H2Si H2Cl2Si
Disposable Permeation Tube Trace Source ELSRT-2 - Cl2H2Si H2Cl2Si
Used for generating low to moderate concentrations of high vapor pressure compounds such as Cl2, NO2, and NH3. Typical emission rate is sub-ppm to 2.5 ppm, depending on the compound and the operating temperature. This type of tube is also used for field service where higher operating temperatures may be required.

Used for generating low to moderate concentrations of high vapor pressure compounds such as Cl2, NO2, and NH3. Typical emission rate is sub-ppm to 2.5 ppm, depending on the compound
and the operating temperature. This type of tube is also used for field service where higher operating temperatures may be required.

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Technical Specifications

  Kin-Tek Laboratories Inc.
Product Category Industrial Gases
Product Number Trace Source ELSRT-2 - Cl2H2Si H2Cl2Si
Product Name Disposable Permeation Tube
Industrial Gases Silicon-based; Dichlorosilane
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