Indium Corporation’s Indium (In) Sputtering Targets offer tight control of the final thin-film composition. This is due to our unique manufacturing process that results in a fine grain monolithic material. Impurity levels are controlled before and during the manufacturing process.
Application
Indium Sputtering Targets can be used in a variety of applications:
CIS/CIGS Indium Sputtering Targets are commonly used with CuGa Sputtering Targets to co-deposit copper, indium, and gallium in combination with sulfur/selenium to form the active layer on CIS/ CIGS thin-film solar cells.
Reactive Thin-Films Indium Sputtering Targets can be reactively sputtered with oxygen and other materials to create transparent conductive oxide layers (TCO) on glass or alternative substrates.
Bonding Indium Sputtering Targets can be used to deposit pure indium for room-temperature or low-temperture bonding applications, such as flip-chip bonding and cold welding.
Indium Corporation’s Indium (In) Sputtering Targets offer tight control of the final thin-film composition. This is due to our unique manufacturing process that results in a fine grain monolithic material. Impurity levels are controlled before and during the manufacturing process.
Application
Indium Sputtering Targets can be used in a variety of applications:
- CIS/CIGS Indium Sputtering Targets are commonly used with CuGa Sputtering Targets to co-deposit copper, indium, and gallium in combination with sulfur/selenium to form the active layer on CIS/ CIGS thin-film solar cells.
- Reactive Thin-Films Indium Sputtering Targets can be reactively sputtered with oxygen and other materials to create transparent conductive oxide layers (TCO) on glass or alternative substrates.
- Bonding Indium Sputtering Targets can be used to deposit pure indium for room-temperature or low-temperture bonding applications, such as flip-chip bonding and cold welding.
