Comdel, Inc. VF3 Multi-Channel Synthesizer VF3

Description
Accommodates up to 3 Channels and a Wide Range of Frequencies Performance: Comdel's VF3 multi channel synthesizer modules provide phase adjustable output to avoid destructive arcing and cross-talk in multiple cathode plasma processing chambers. The VF3 can accommodate up to 3 channels and may be programmed to any frequency between 2 and 60 MHz. Frequency changes are simultaneous and phase continuous. The phase of each channel can be adjusted to an accuracy greater than 0.1 degree resolution. The VF3 allows adjustment for cable length dependencies. Applications: The VF series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications. Features: Programmable to any frequency between 2 and 60 MHz Ability to store multiple phase offsets for batch processing Simultaneous and phase continuous frequency changes Allows adjustment for cable length dependencies Ability to automate tuning process All channels can be individually programmed for different frequencies
Datasheet
Description
Accommodates up to 3 Channels and a Wide Range of Frequencies Performance: Comdel's VF3 multi channel synthesizer modules provide phase adjustable output to avoid destructive arcing and cross-talk in multiple cathode plasma processing chambers. The VF3 can accommodate up to 3 channels and may be programmed to any frequency between 2 and 60 MHz. Frequency changes are simultaneous and phase continuous. The phase of each channel can be adjusted to an accuracy greater than 0.1 degree resolution. The VF3 allows adjustment for cable length dependencies. Applications: The VF series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications. Features: Programmable to any frequency between 2 and 60 MHz Ability to store multiple phase offsets for batch processing Simultaneous and phase continuous frequency changes Allows adjustment for cable length dependencies Ability to automate tuning process All channels can be individually programmed for different frequencies
Datasheet

Suppliers

Company
Product
Description
Supplier Links
VF3 Multi-Channel Synthesizer - VF3 - Comdel, Inc.
Gloucester, MA, USA
VF3 Multi-Channel Synthesizer
VF3
VF3 Multi-Channel Synthesizer VF3
Accommodates up to 3 Channels and a Wide Range of Frequencies Performance: Comdel's VF3 multi channel synthesizer modules provide phase adjustable output to avoid destructive arcing and cross-talk in multiple cathode plasma processing chambers. The VF3 can accommodate up to 3 channels and may be programmed to any frequency between 2 and 60 MHz. Frequency changes are simultaneous and phase continuous. The phase of each channel can be adjusted to an accuracy greater than 0.1 degree resolution. The VF3 allows adjustment for cable length dependencies. Applications: The VF series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications. Features: Programmable to any frequency between 2 and 60 MHz Ability to store multiple phase offsets for batch processing Simultaneous and phase continuous frequency changes Allows adjustment for cable length dependencies Ability to automate tuning process All channels can be individually programmed for different frequencies

Accommodates up to 3 Channels and a Wide Range of Frequencies

Performance:
Comdel's VF3 multi channel synthesizer modules provide phase adjustable output to avoid destructive arcing and cross-talk in multiple cathode plasma processing chambers. The VF3 can accommodate up to 3 channels and may be programmed to any frequency between 2 and 60 MHz. Frequency changes are simultaneous and phase continuous. The phase of each channel can be adjusted to an accuracy greater than 0.1 degree resolution. The VF3 allows adjustment for cable length dependencies.

Applications:
The VF series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications.

Features:

  • Programmable to any frequency between 2 and 60 MHz
  • Ability to store multiple phase offsets for batch processing
  • Simultaneous and phase continuous frequency changes
  • Allows adjustment for cable length dependencies
  • Ability to automate tuning process
  • All channels can be individually programmed for different frequencies
Supplier's Site Datasheet

Technical Specifications

  Comdel, Inc.
Product Category Frequency Synthesizers
Product Number VF3
Product Name VF3 Multi-Channel Synthesizer
Synthesizer Type Direct Synthesis
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