Comdel, Inc. CLX Series - Low Frequency RF Power CLX 1250

Description
Proven Reliability in Plasma Vacuum Systems Worldwide Performance: The CLX series low frequency RF power supplies are available in power ranges from 600 to 10,000 Watts with fixed frequencies from 20 kHz to 2 MHz, and frequency agile capability up to 10% bandwidth. The CLX 1250 provides 1250 watts of power. The solid-state design provides low cost of ownership with high reliability. Applications: The CLX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems. Features: Reliable amplifier design with millions of trouble-free hours driving plasma systems worldwide Local control via encoder and softkey inputs Standard RS-232 and analog/digital control Control circuitry ensures consistency during high VSWR conditions Unique power monitoring measures delivered power into any impedance load Active front panel with full controls and programmable microprocessor
Datasheet
Description
Proven Reliability in Plasma Vacuum Systems Worldwide Performance: The CLX series low frequency RF power supplies are available in power ranges from 600 to 10,000 Watts with fixed frequencies from 20 kHz to 2 MHz, and frequency agile capability up to 10% bandwidth. The CLX 1250 provides 1250 watts of power. The solid-state design provides low cost of ownership with high reliability. Applications: The CLX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems. Features: Reliable amplifier design with millions of trouble-free hours driving plasma systems worldwide Local control via encoder and softkey inputs Standard RS-232 and analog/digital control Control circuitry ensures consistency during high VSWR conditions Unique power monitoring measures delivered power into any impedance load Active front panel with full controls and programmable microprocessor
Datasheet

Suppliers

Company
Product
Description
Supplier Links
CLX Series - Low Frequency RF Power - CLX 1250 - Comdel, Inc.
Gloucester, MA, USA
CLX Series - Low Frequency RF Power
CLX 1250
CLX Series - Low Frequency RF Power CLX 1250
Proven Reliability in Plasma Vacuum Systems Worldwide Performance: The CLX series low frequency RF power supplies are available in power ranges from 600 to 10,000 Watts with fixed frequencies from 20 kHz to 2 MHz, and frequency agile capability up to 10% bandwidth. The CLX 1250 provides 1250 watts of power. The solid-state design provides low cost of ownership with high reliability. Applications: The CLX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems. Features: Reliable amplifier design with millions of trouble-free hours driving plasma systems worldwide Local control via encoder and softkey inputs Standard RS-232 and analog/digital control Control circuitry ensures consistency during high VSWR conditions Unique power monitoring measures delivered power into any impedance load Active front panel with full controls and programmable microprocessor

Proven Reliability in Plasma Vacuum Systems Worldwide

Performance:
The CLX series low frequency RF power supplies are available in power ranges from 600 to 10,000 Watts with fixed frequencies from 20 kHz to 2 MHz, and frequency agile capability up to 10% bandwidth. The CLX 1250 provides 1250 watts of power. The solid-state design provides low cost of ownership with high reliability.
Applications:
The CLX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Features:

  • Reliable amplifier design with millions of trouble-free hours driving plasma systems worldwide
  • Local control via encoder and softkey inputs
  • Standard RS-232 and analog/digital control
  • Control circuitry ensures consistency during high VSWR conditions
  • Unique power monitoring measures delivered power into any impedance load
  • Active front panel with full controls and programmable microprocessor
Supplier's Site Datasheet

Technical Specifications

  Comdel, Inc.
Product Category Power Supplies
Product Number CLX 1250
Product Name CLX Series - Low Frequency RF Power
Type RF Generator; Plasma Power Supply
Form Factor Rack Mount
Applications High Frequency, Semiconductor/Thin Film, Etch, Parallel Plate, RF Sputtering
Features Adjustable Frequency
DC Output Voltage -5.0 to 10.0 volts
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