Comdel, Inc. CLX Series - Low Frequency RF Power CLX 10000

Description
Proven Reliability in Plasma Vacuum Systems Worldwide Performance: The CLX series low frequency RF power supplies are available in power ranges from 600 to 10,000 Watts with fixed frequencies from 20 kHz to 2 MHz, and frequency agile capability up to 10% bandwidth. The CLX 10000 provides 10,000 watts of power. The solid-state design provides low cost of ownership with high reliability. Applications: The CLX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems. Features: Reliable amplifier design with millions of trouble-free hours driving plasma systems worldwide Local control via encoder and softkey inputs Standard RS-232 and analog/digital control Control circuitry ensures consistency during high VSWR conditions Unique power monitoring measures delivered power into any impedance load Active front panel with full controls and programmable microprocessor
Datasheet
Description
Proven Reliability in Plasma Vacuum Systems Worldwide Performance: The CLX series low frequency RF power supplies are available in power ranges from 600 to 10,000 Watts with fixed frequencies from 20 kHz to 2 MHz, and frequency agile capability up to 10% bandwidth. The CLX 10000 provides 10,000 watts of power. The solid-state design provides low cost of ownership with high reliability. Applications: The CLX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems. Features: Reliable amplifier design with millions of trouble-free hours driving plasma systems worldwide Local control via encoder and softkey inputs Standard RS-232 and analog/digital control Control circuitry ensures consistency during high VSWR conditions Unique power monitoring measures delivered power into any impedance load Active front panel with full controls and programmable microprocessor
Datasheet

Suppliers

Company
Product
Description
Supplier Links
CLX Series - Low Frequency RF Power - CLX 10000 - Comdel, Inc.
Gloucester, MA, USA
CLX Series - Low Frequency RF Power
CLX 10000
CLX Series - Low Frequency RF Power CLX 10000
Proven Reliability in Plasma Vacuum Systems Worldwide Performance: The CLX series low frequency RF power supplies are available in power ranges from 600 to 10,000 Watts with fixed frequencies from 20 kHz to 2 MHz, and frequency agile capability up to 10% bandwidth. The CLX 10000 provides 10,000 watts of power. The solid-state design provides low cost of ownership with high reliability. Applications: The CLX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems. Features: Reliable amplifier design with millions of trouble-free hours driving plasma systems worldwide Local control via encoder and softkey inputs Standard RS-232 and analog/digital control Control circuitry ensures consistency during high VSWR conditions Unique power monitoring measures delivered power into any impedance load Active front panel with full controls and programmable microprocessor

Proven Reliability in Plasma Vacuum Systems Worldwide

Performance:
The CLX series low frequency RF power supplies are available in power ranges from 600 to 10,000 Watts with fixed frequencies from 20 kHz to 2 MHz, and frequency agile capability up to 10% bandwidth. The CLX 10000 provides 10,000 watts of power. The solid-state design provides low cost of ownership with high reliability.
Applications:
The CLX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Features:

  • Reliable amplifier design with millions of trouble-free hours driving plasma systems worldwide
  • Local control via encoder and softkey inputs
  • Standard RS-232 and analog/digital control
  • Control circuitry ensures consistency during high VSWR conditions
  • Unique power monitoring measures delivered power into any impedance load
  • Active front panel with full controls and programmable microprocessor
Supplier's Site Datasheet

Technical Specifications

  Comdel, Inc.
Product Category Power Supplies
Product Number CLX 10000
Product Name CLX Series - Low Frequency RF Power
Type RF Generator; Plasma Power Supply
Form Factor Rack Mount
Applications Semiconductor/Thin Film, Semiconductor Processing, RIE, CVD, PVD
Features Adjustable Frequency; Pure Sine Output; Unique Power Monitoring
DC Output Power 10000 watts
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