Stable, Reliable, Low Frequency Power for Industrial Heating and Plasma Processing Applications
Performance:
The CLF series generators provide stable process power up to 5 kW. The CLF 1000 provides 1000 watts of power. The half-rack supplies operate at any fixed frequency from 20 to 50 kHz. In many applications, the combination of auto-tune and excess power headroom will allow delivery of power to changing reactive loads without the need for mechanically tuned matching networks.
Applications:
The CLF series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.
Features:
| Comdel, Inc. | |
|---|---|
| Product Category | Power Supplies |
| Product Number | CLF 1000 Half Rack |
| Product Name | CLF Series - Low Frequency RF Power |
| Type | RF Generator; Plasma Power Supply |
| Form Factor | Rack Mount |
| Applications | Semiconductor/Thin Film, RIE, ICP, PVD, Semiconductor Processing |
| Features | Pure Sine Output; Cooling by Forced Air |
| DC Output Power | 1000 watts |
