Comdel, Inc. CLF Series - Low Frequency RF Power CLF 1000 Full Rack

Description
Stable, Reliable, Low Frequency Power for Industrial Heating and Plasma Processing Applications Performance: The CLF series generators provide stable process power up to 5 kW. The CLF 1000 provides 1000 watts of power. The full- rack models operate at any fixed frequency from 20 to 450 kHz or auto-tuned up to +/- 15% bandwidth. In many applications, the combination of auto-tune and excess power headroom will allow delivery of power to changing reactive loads without the need for mechanically tuned matching networks. Applications: The CLF series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems. Features: Output power leveled on delivered power No preventative maintenance required, maximum generator uptime Protection circuits safeguard amplifiers from over-voltage, over-current and over-power operating conditions Fast auto-tune circuitry on full-rack models
Datasheet
Description
Stable, Reliable, Low Frequency Power for Industrial Heating and Plasma Processing Applications Performance: The CLF series generators provide stable process power up to 5 kW. The CLF 1000 provides 1000 watts of power. The full- rack models operate at any fixed frequency from 20 to 450 kHz or auto-tuned up to +/- 15% bandwidth. In many applications, the combination of auto-tune and excess power headroom will allow delivery of power to changing reactive loads without the need for mechanically tuned matching networks. Applications: The CLF series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems. Features: Output power leveled on delivered power No preventative maintenance required, maximum generator uptime Protection circuits safeguard amplifiers from over-voltage, over-current and over-power operating conditions Fast auto-tune circuitry on full-rack models
Datasheet

Suppliers

Company
Product
Description
Supplier Links
CLF Series - Low Frequency RF Power - CLF 1000 Full Rack - Comdel, Inc.
Gloucester, MA, USA
CLF Series - Low Frequency RF Power
CLF 1000 Full Rack
CLF Series - Low Frequency RF Power CLF 1000 Full Rack
Stable, Reliable, Low Frequency Power for Industrial Heating and Plasma Processing Applications Performance: The CLF series generators provide stable process power up to 5 kW. The CLF 1000 provides 1000 watts of power. The full- rack models operate at any fixed frequency from 20 to 450 kHz or auto-tuned up to +/- 15% bandwidth. In many applications, the combination of auto-tune and excess power headroom will allow delivery of power to changing reactive loads without the need for mechanically tuned matching networks. Applications: The CLF series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems. Features: Output power leveled on delivered power No preventative maintenance required, maximum generator uptime Protection circuits safeguard amplifiers from over-voltage, over-current and over-power operating conditions Fast auto-tune circuitry on full-rack models

Stable, Reliable, Low Frequency Power for Industrial Heating and Plasma Processing Applications

Performance:
The CLF series generators provide stable process power up to 5 kW. The CLF 1000 provides 1000 watts of power. The full- rack models operate at any fixed frequency from 20 to 450 kHz or auto-tuned up to +/- 15% bandwidth. In many applications, the combination of auto-tune and excess power headroom will allow delivery of power to changing reactive loads without the need for mechanically tuned matching networks.
Applications:
The CLF series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Features:

  • Output power leveled on delivered power
  • No preventative maintenance required, maximum generator uptime
  • Protection circuits safeguard amplifiers from over-voltage, over-current and over-power operating conditions
  • Fast auto-tune circuitry on full-rack models
Supplier's Site Datasheet

Technical Specifications

  Comdel, Inc.
Product Category Power Supplies
Product Number CLF 1000 Full Rack
Product Name CLF Series - Low Frequency RF Power
Type RF Generator; Plasma Power Supply
Form Factor Rack Mount
Applications Semiconductor/Thin Film, RIE, ICP, PVD, Semiconductor Processing
Features Adjustable Frequency; Pure Sine Output; Cooling by Forced Air
DC Output Power 1000 watts
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