Hitachi High Technologies America, Inc. Focused Ion and Electron Beam NX2000

Description
FIB-SEM systems have become an indispensable tool for characterization and analysis of the latest technologies and high performance nano-scale materials. An ever-increasing demand for ultrathin TEM lamellas without artifacts during FIB processing require the best in ion and electron optics technologies. Hitachi's NX2000 high performance FIB and high resolution SEM system with its unique sample orientation control* and triple beam* technologies, supports high throughput, and high quality TEM sample preparation for cutting edge applications. High contrast, real-time SEM end point detection allows ultrathin TEM sample preparation of sub 20 nm devices.
Description
FIB-SEM systems have become an indispensable tool for characterization and analysis of the latest technologies and high performance nano-scale materials. An ever-increasing demand for ultrathin TEM lamellas without artifacts during FIB processing require the best in ion and electron optics technologies. Hitachi's NX2000 high performance FIB and high resolution SEM system with its unique sample orientation control* and triple beam* technologies, supports high throughput, and high quality TEM sample preparation for cutting edge applications. High contrast, real-time SEM end point detection allows ultrathin TEM sample preparation of sub 20 nm devices.

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Focused Ion and Electron Beam - NX2000 - Hitachi High Technologies America, Inc.
Schaumburg, IL, USA
Focused Ion and Electron Beam
NX2000
Focused Ion and Electron Beam NX2000
FIB-SEM systems have become an indispensable tool for characterization and analysis of the latest technologies and high performance nano-scale materials. An ever-increasing demand for ultrathin TEM lamellas without artifacts during FIB processing require the best in ion and electron optics technologies. Hitachi's NX2000 high performance FIB and high resolution SEM system with its unique sample orientation control* and triple beam* technologies, supports high throughput, and high quality TEM sample preparation for cutting edge applications. High contrast, real-time SEM end point detection allows ultrathin TEM sample preparation of sub 20 nm devices.

FIB-SEM systems have become an indispensable tool for characterization and analysis of the latest technologies and high performance nano-scale materials. An ever-increasing demand for ultrathin TEM lamellas without artifacts during FIB processing require the best in ion and electron optics technologies. Hitachi's NX2000 high performance FIB and high resolution SEM system with its unique sample orientation control* and triple beam* technologies, supports high throughput, and high quality TEM sample preparation for cutting edge applications.

High contrast, real-time SEM end point detection allows ultrathin TEM sample preparation of sub 20 nm devices.

Supplier's Site

Technical Specifications

  Hitachi High Technologies America, Inc.
Product Category Microscopes
Product Number NX2000
Product Name Focused Ion and Electron Beam
Application Biological / Life Sciences; Medical / Forensic
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