Hitachi High Technologies America, Inc. Magnetic Head Etch System E-6000 Series

Description
Rapid increases in aerial densities of HDD (Hard Disk Drive) requires advanced patterning solutions for thin film head production. This brings leading-edge semiconductor processes into the HDD industry as a breakthrough. Magnetic Head Etch System E-6000 Series: the EMCP (Electro Magnetically Coupled Plasma) etch system provides superior performance in profile control as well as in higher etching rate and selectivity compared to conventional ion-milling processes. Applicable wafer diameter 150mm, 200mm
Description
Rapid increases in aerial densities of HDD (Hard Disk Drive) requires advanced patterning solutions for thin film head production. This brings leading-edge semiconductor processes into the HDD industry as a breakthrough. Magnetic Head Etch System E-6000 Series: the EMCP (Electro Magnetically Coupled Plasma) etch system provides superior performance in profile control as well as in higher etching rate and selectivity compared to conventional ion-milling processes. Applicable wafer diameter 150mm, 200mm

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Magnetic Head Etch System - E-6000 Series - Hitachi High Technologies America, Inc.
Schaumburg, IL, USA
Magnetic Head Etch System
E-6000 Series
Magnetic Head Etch System E-6000 Series
Rapid increases in aerial densities of HDD (Hard Disk Drive) requires advanced patterning solutions for thin film head production. This brings leading-edge semiconductor processes into the HDD industry as a breakthrough. Magnetic Head Etch System E-6000 Series: the EMCP (Electro Magnetically Coupled Plasma) etch system provides superior performance in profile control as well as in higher etching rate and selectivity compared to conventional ion-milling processes. Applicable wafer diameter 150mm, 200mm

Rapid increases in aerial densities of HDD (Hard Disk Drive) requires advanced patterning solutions for thin film head production.

This brings leading-edge semiconductor processes into the HDD industry as a breakthrough. Magnetic Head Etch System E-6000 Series: the EMCP (Electro Magnetically Coupled Plasma) etch system provides superior performance in profile control as well as in higher etching rate and selectivity compared to conventional ion-milling processes.

Applicable wafer diameter150mm, 200mm
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Technical Specifications

  Hitachi High Technologies America, Inc.
Product Category Wafer and Thin Film Instrumentation
Product Number E-6000 Series
Product Name Magnetic Head Etch System
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