Edwards Vacuum STPA Turbomolecular Pump STPA1603C

Description
The small and powerful Edwards STPA1603C turbo-molecular pump has been designed using Edwards advanced rotor technology. This provides high throughput, maximum reliability and class leading performance which is demanded by the latest generation of semiconductor processes. Its half rack controller and compact design provide considerable space saving, whilst its advanced deposition reduction system gives improved reliability and performance. The STPA1603C has been qualified on the latest 200 mm etch tools as well as on new generation 300 mm oxide etch processes.
Description
The small and powerful Edwards STPA1603C turbo-molecular pump has been designed using Edwards advanced rotor technology. This provides high throughput, maximum reliability and class leading performance which is demanded by the latest generation of semiconductor processes. Its half rack controller and compact design provide considerable space saving, whilst its advanced deposition reduction system gives improved reliability and performance. The STPA1603C has been qualified on the latest 200 mm etch tools as well as on new generation 300 mm oxide etch processes.

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STPA Turbomolecular Pump - STPA1603C - Edwards Vacuum
Crawley, West Sussex, United Kingdom
STPA Turbomolecular Pump
STPA1603C
STPA Turbomolecular Pump STPA1603C
The small and powerful Edwards STPA1603C turbo-molecular pump has been designed using Edwards advanced rotor technology. This provides high throughput, maximum reliability and class leading performance which is demanded by the latest generation of semiconductor processes. Its half rack controller and compact design provide considerable space saving, whilst its advanced deposition reduction system gives improved reliability and performance. The STPA1603C has been qualified on the latest 200 mm etch tools as well as on new generation 300 mm oxide etch processes.

The small and powerful Edwards STPA1603C turbo-molecular pump has been designed using Edwards advanced rotor technology. This provides high throughput, maximum reliability and class leading performance which is demanded by the latest generation of semiconductor processes. Its half rack controller and compact design provide considerable space saving, whilst its advanced deposition reduction system gives improved reliability and performance. The STPA1603C has been qualified on the latest 200 mm etch tools as well as on new generation 300 mm oxide etch processes.

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Technical Specifications

  Edwards Vacuum
Product Category High Vacuum Pumps
Product Number STPA1603C
Product Name STPA Turbomolecular Pump
Configuration Individual Vacuum Pump
Application Industrial; Chemical; Semiconductor; Ultrahigh Vacuum Applications
Features Magnetic Bearing
Ultimate Vacuum 7.50E-8 torr (29.92 in Hg vac)
Pumping Speed 2543 to 3390 CFM (4324 to 5766 m³/hr)
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