Edwards Vacuum STP-XA Turbomolecular Pump STP-XA3203C

Description
The STP-XA3203C turbo pump offers high performance in the process range of high vacuum to 2300 sccm process flow with enhanced throughput for all gases. This pump is based on a new platform design offering features to improve thermal management, which enhances performance on harsh processes, increases the maximum process flow capability and reduces the effects of corrosion and deposition. The outstanding performance is suited to both light and harsh applications, such as semiconductor etch, implant, lithography and LCD processes.
Description
The STP-XA3203C turbo pump offers high performance in the process range of high vacuum to 2300 sccm process flow with enhanced throughput for all gases. This pump is based on a new platform design offering features to improve thermal management, which enhances performance on harsh processes, increases the maximum process flow capability and reduces the effects of corrosion and deposition. The outstanding performance is suited to both light and harsh applications, such as semiconductor etch, implant, lithography and LCD processes.

Suppliers

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Product
Description
Supplier Links
STP-XA Turbomolecular Pump - STP-XA3203C - Edwards Vacuum
Crawley, West Sussex, United Kingdom
STP-XA Turbomolecular Pump
STP-XA3203C
STP-XA Turbomolecular Pump STP-XA3203C
The STP-XA3203C turbo pump offers high performance in the process range of high vacuum to 2300 sccm process flow with enhanced throughput for all gases. This pump is based on a new platform design offering features to improve thermal management, which enhances performance on harsh processes, increases the maximum process flow capability and reduces the effects of corrosion and deposition. The outstanding performance is suited to both light and harsh applications, such as semiconductor etch, implant, lithography and LCD processes.

The STP-XA3203C turbo pump offers high performance in the process range of high vacuum to 2300 sccm process flow with enhanced throughput for all gases. This pump is based on a new platform design offering features to improve thermal management, which enhances performance on harsh processes, increases the maximum process flow capability and reduces the effects of corrosion and deposition. The outstanding performance is suited to both light and harsh applications, such as semiconductor etch, implant, lithography and LCD processes.

Supplier's Site

Technical Specifications

  Edwards Vacuum
Product Category High Vacuum Pumps
Product Number STP-XA3203C
Product Name STP-XA Turbomolecular Pump
Configuration Individual Vacuum Pump
Application Industrial; Chemical; Semiconductor; Ultrahigh Vacuum Applications
Features Magnetic Bearing
Ultimate Vacuum 7.50E-8 torr (29.92 in Hg vac)
Pumping Speed 4873 to 6780 CFM (8288 to 11531 m³/hr)
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