EBARA Technologies, Inc. GCR Abatement System

Description
Ebara's GCR abatement systems cleanly and efficiently remove carbon monoxide and PFC gases from ashing and oxide etch semiconductor waste streams. The standard GCR model targets CO gases using a high temperature oxidation path. PFC's such as CF4 are decomposed using an optional metal catalyst substrate. High destruction efficiency is accomplished by maximizing the gas residence time inside the high temperature reactor. Two GCR sizes are available to handle a variety of gas loads:
  • GCR Abatement System - EBARA Technologies, Inc.
    EBARA Technologies, Inc.
Description
Ebara's GCR abatement systems cleanly and efficiently remove carbon monoxide and PFC gases from ashing and oxide etch semiconductor waste streams. The standard GCR model targets CO gases using a high temperature oxidation path. PFC's such as CF4 are decomposed using an optional metal catalyst substrate. High destruction efficiency is accomplished by maximizing the gas residence time inside the high temperature reactor. Two GCR sizes are available to handle a variety of gas loads:

Suppliers

Company
Product
Description
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GCR Abatement System - - EBARA Technologies, Inc.
EBARA Technologies, Inc.
Sacramento, CA, USA
GCR Abatement System
GCR Abatement System
Ebara's GCR abatement systems cleanly and efficiently remove carbon monoxide and PFC gases from ashing and oxide etch semiconductor waste streams. The standard GCR model targets CO gases using a high temperature oxidation path. PFC's such as CF4 are decomposed using an optional metal catalyst substrate. High destruction efficiency is accomplished by maximizing the gas residence time inside the high temperature reactor. Two GCR sizes are available to handle a variety of gas loads:

Ebara's GCR abatement systems cleanly and efficiently remove carbon monoxide and PFC gases from ashing and oxide etch semiconductor waste streams. The standard GCR model targets CO gases using a high temperature oxidation path. PFC's such as CF4 are decomposed using an optional metal catalyst substrate. High destruction efficiency is accomplished by maximizing the gas residence time inside the high temperature reactor. Two GCR sizes are available to handle a variety of gas loads:

Supplier's Site

Technical Specifications

  EBARA Technologies, Inc.
Product Category Scrubbers
Product Name GCR Abatement System
Scrubber Type Skid / Base Plate Mounted
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