Design Features
Advanced silicon-carbide structure for high-dynamics and ultra-precise motion performance
Speeds to 1.5 m/s and accelerations to 5 g
Proprietary reaction-mass design enables fast turnaround and move-and-settle times
Active and passive isolation system options
Encoder or laser interferometer feedback
Linear motors with improved thermal management
Advanced control solutions offer enhanced throughput
Aerotech’s long history of supplying ultra-precise positioning systems in high-technology fields such as semiconductor manufacturing has enabled ongoing development and improvement of key motion technologies. By building upon these technologies, Aerotech has developed the PlanarHDX, the most advanced commercially available planar air-bearing platform on the market. Designed using an FEA-optimized silicon carbide structure and optimized air-bearing compensation techniques, the PlanarHDX provides the highest possible dynamic performance while maintaining unparalleled geometric characteristics and positioning accuracy.
Design Features
- Advanced silicon-carbide structure for high-dynamics and ultra-precise motion performance
- Speeds to 1.5 m/s and accelerations to 5 g
- Proprietary reaction-mass design enables fast turnaround and move-and-settle times
- Active and passive isolation system options
- Encoder or laser interferometer feedback
- Linear motors with improved thermal management
- Advanced control solutions offer enhanced throughput
Aerotech’s long history of supplying ultra-precise positioning systems in high-technology fields such as semiconductor manufacturing has enabled ongoing development and improvement of key motion technologies. By building upon these technologies, Aerotech has developed the PlanarHDX, the most advanced commercially available planar air-bearing platform on the market. Designed using an FEA-optimized silicon carbide structure and optimized air-bearing compensation techniques, the PlanarHDX provides the highest possible dynamic performance while maintaining unparalleled geometric characteristics and positioning accuracy.
