MicroSense, LLC Polar Kerr System for MRAM

Description
The Polar Kerr System for MRAM utilizes the polar Magneto-Optical Kerr Effect (MOKE) to characterize the magnetic properties of multi-layer wafers used in the development and manufacturing of perpendicular MRAM. Utilizing a non-contact full-wafer measurement technique, the system creates a map of the magnetic properties of entire wafers up to 300 mm. The system is available in a manual loading or fully-automated configuration for use in R&D and/or production. Using the proprietary direct field control technique of MicroSense magnetic metrology tools, the Polar Kerr for MRAM system offers high field capabilities and low field resolution to characterize free and pinned layer properties in a single system
Description
The Polar Kerr System for MRAM utilizes the polar Magneto-Optical Kerr Effect (MOKE) to characterize the magnetic properties of multi-layer wafers used in the development and manufacturing of perpendicular MRAM. Utilizing a non-contact full-wafer measurement technique, the system creates a map of the magnetic properties of entire wafers up to 300 mm. The system is available in a manual loading or fully-automated configuration for use in R&D and/or production. Using the proprietary direct field control technique of MicroSense magnetic metrology tools, the Polar Kerr for MRAM system offers high field capabilities and low field resolution to characterize free and pinned layer properties in a single system

Suppliers

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Product
Description
Supplier Links
Polar Kerr System for MRAM -  - MicroSense, LLC
Lowell, MA, USA
Polar Kerr System for MRAM
Polar Kerr System for MRAM
The Polar Kerr System for MRAM utilizes the polar Magneto-Optical Kerr Effect (MOKE) to characterize the magnetic properties of multi-layer wafers used in the development and manufacturing of perpendicular MRAM. Utilizing a non-contact full-wafer measurement technique, the system creates a map of the magnetic properties of entire wafers up to 300 mm. The system is available in a manual loading or fully-automated configuration for use in R&D and/or production. Using the proprietary direct field control technique of MicroSense magnetic metrology tools, the Polar Kerr for MRAM system offers high field capabilities and low field resolution to characterize free and pinned layer properties in a single system

The Polar Kerr System for MRAM utilizes the polar Magneto-Optical Kerr Effect (MOKE) to characterize the magnetic properties of multi-layer wafers used in the development and manufacturing of perpendicular MRAM. Utilizing a non-contact full-wafer measurement technique, the system creates a map of the magnetic properties of entire wafers up to 300 mm. The system is available in a manual loading or fully-automated configuration for use in R&D and/or production. Using the proprietary direct field control technique of MicroSense magnetic metrology tools, the Polar Kerr for MRAM system offers high field capabilities and low field resolution to characterize free and pinned layer properties in a single system

Supplier's Site

Technical Specifications

  MicroSense, LLC
Product Category Wafer and Thin Film Instrumentation
Product Name Polar Kerr System for MRAM
Form Factor Monitor or instrument
Mounting / Loading Floor
Technology Magnetometer
Applications Wafer
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