Matexcel Graphene Film on Silicon Oxide Substrates GRA-315

Description
Type: P type heavily doped (R: 3*3Ω10cm) Thickness: 525+20μm Thickness of oxide layer: 300nm Layers: single layer or muti-layers (<10) Size: 1*1cm, 2*2cm, 5*5cm Coverage rate: 97% or 85%
  • Graphene Film on Silicon Oxide Substrates - GRA-315 - Matexcel
    Matexcel
Datasheet
Description
Type: P type heavily doped (R: 3*3Ω10cm) Thickness: 525+20μm Thickness of oxide layer: 300nm Layers: single layer or muti-layers (<10) Size: 1*1cm, 2*2cm, 5*5cm Coverage rate: 97% or 85%
Datasheet

Suppliers

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Product
Description
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Graphene Film on Silicon Oxide Substrates - GRA-315 - Matexcel
Matexcel
Shirley, NY, United States
Graphene Film on Silicon Oxide Substrates
GRA-315
Graphene Film on Silicon Oxide Substrates GRA-315
Type: P type heavily doped (R: 3*3Ω10cm) Thickness: 525+20μm Thickness of oxide layer: 300nm Layers: single layer or muti-layers (<10) Size: 1*1cm, 2*2cm, 5*5cm Coverage rate: 97% or 85%

Type: P type heavily doped (R: 3*3Ω10cm)
Thickness: 525+20μm
Thickness of oxide layer: 300nm
Layers: single layer or muti-layers (<10)
Size: 1*1cm, 2*2cm, 5*5cm
Coverage rate: 97% or 85%

Supplier's Site Datasheet

Technical Specifications

  Matexcel
Product Category Industrial Ceramic Materials
Product Number GRA-315
Product Name Graphene Film on Silicon Oxide Substrates
Material Type Silicate / Clay
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