Linde North America, Inc. Deuterated Silane

Semiconductor Grade Chemical Purity: ≥99.99% Isotopic Enrichment: ≥99 atom% Deuterated Silane is used in Gigabyte DRAM production as a source of silicon without hydrogen, where the hydrogen that is typically incorporated in the crystal lattice, is detrimental to the high-speed operation of the gate. The heavier deuterium within the lattice provides a “mass barrier” to the Hot Electron Effect induced damage, thus increasing device life time. Deuterated Silane is a pyrophoric, toxic gas, with a TLV of 0.5 ppm. Deuterated Silane is also used in a variety of research applications to allow determination of hydrogen thermodynamics and incorporation rates.