High precision and high performance HF concentration monitor enables micro-process management with +/- 2.0 ppm (highest accuracy), high speed sampling & output, 2-channel sensors, and intra-sensor pressure correction function. Suitable for the semiconductor finest process control.
High precision : +/- 2.0 ppm (highest accuracy)
High speed sampling & output
2-channel sensors achieves the measurement of both the supply tank and chamber
Intra-sensor pressure correction function
High precision and high performance HF concentration monitor enables micro-process management with +/- 2.0 ppm (highest accuracy), high speed sampling & output, 2-channel sensors, and intra-sensor pressure correction function.
Suitable for the semiconductor finest process control.
- High precision : +/- 2.0 ppm (highest accuracy)
- High speed sampling & output
- 2-channel sensors achieves the measurement of both the supply tank and chamber
- Intra-sensor pressure correction function
