HORIBA Instruments, Inc. SC-1 Solution Concentration Monitor CS-131

Description
The CS-131 is a high-precision chemical concentration monitor designed for use with SC-1 solutions used in cleaning processes during semiconductor manufacturing. It offers a faster response speed in a more compact size than anything available to date. The CS-131 monitors the concentrations of the individual components of the SC-1 solutions (NH3/H2O2/H2O) which is widely used to remove particles and organic substances. The monitor has a number of outputs which can be utilized to keep the concentrations of the individual elements of the SC-1 solutions within the allowable ranges; this eliminates unnecessary replacement of chemicals potentially increasing bath life time and reducing chemical cost. In addition, a model with an integrated cooling unit is available, allowing accommodation of a broader range of sample temperatures A measurement cycle of approx. 2 seconds supports concentration management for 300 mm processes. A very short measurement cycle* of approximately two seconds means fast response. Frequent feedback for both single-bath and batch type cleaning devices is supported. *Does not include chemical replacement and cooling times. The compact design of the CS-131, only two-thirds* of previous models allow for easy integration into your wafer cleaning system. *Compared to the CS-220 series. Fewer lot defects in the cleaning process means a higher yield Outputs from the monitor are used for replenishment control of the SC-1 solutions, enabling cleaning with a high reproducibility rate. There are fewer defects in the cleaning process, this helps boost the overall yield. Fully automated measurement for simplifies control. Measurement is fully automatic; no control is required once the system has been installed and measurement has begun. Air is used for reference spectral measurement removing the need of a utility water supply. Comprehensive counter measures to eliminate air bubbles enable the CS-131 to measure of high-temperature samples. Air bubbles are separated out in a bubble removing tank, while an electromagnetic valve minimizes mixing of air bubbles in the flow cell during measurement. If the monitor has an integrated cooling unit, high-temperature samples can be measured directly. Temperature compensation is carried out automatically. Low-voltage 24 V DC is used for the power supply, offering improved safety and protection from electrical shock. An internal leakage sensor can be installed to detect leaks; the supply of the SC-1 solutions can then be shut off in the event of an emergency.
Description
The CS-131 is a high-precision chemical concentration monitor designed for use with SC-1 solutions used in cleaning processes during semiconductor manufacturing. It offers a faster response speed in a more compact size than anything available to date. The CS-131 monitors the concentrations of the individual components of the SC-1 solutions (NH3/H2O2/H2O) which is widely used to remove particles and organic substances. The monitor has a number of outputs which can be utilized to keep the concentrations of the individual elements of the SC-1 solutions within the allowable ranges; this eliminates unnecessary replacement of chemicals potentially increasing bath life time and reducing chemical cost. In addition, a model with an integrated cooling unit is available, allowing accommodation of a broader range of sample temperatures A measurement cycle of approx. 2 seconds supports concentration management for 300 mm processes. A very short measurement cycle* of approximately two seconds means fast response. Frequent feedback for both single-bath and batch type cleaning devices is supported. *Does not include chemical replacement and cooling times. The compact design of the CS-131, only two-thirds* of previous models allow for easy integration into your wafer cleaning system. *Compared to the CS-220 series. Fewer lot defects in the cleaning process means a higher yield Outputs from the monitor are used for replenishment control of the SC-1 solutions, enabling cleaning with a high reproducibility rate. There are fewer defects in the cleaning process, this helps boost the overall yield. Fully automated measurement for simplifies control. Measurement is fully automatic; no control is required once the system has been installed and measurement has begun. Air is used for reference spectral measurement removing the need of a utility water supply. Comprehensive counter measures to eliminate air bubbles enable the CS-131 to measure of high-temperature samples. Air bubbles are separated out in a bubble removing tank, while an electromagnetic valve minimizes mixing of air bubbles in the flow cell during measurement. If the monitor has an integrated cooling unit, high-temperature samples can be measured directly. Temperature compensation is carried out automatically. Low-voltage 24 V DC is used for the power supply, offering improved safety and protection from electrical shock. An internal leakage sensor can be installed to detect leaks; the supply of the SC-1 solutions can then be shut off in the event of an emergency.

Suppliers

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SC-1 Solution Concentration Monitor - CS-131 - HORIBA Instruments, Inc.
Irvine, CA, United States
SC-1 Solution Concentration Monitor
CS-131
SC-1 Solution Concentration Monitor CS-131
The CS-131 is a high-precision chemical concentration monitor designed for use with SC-1 solutions used in cleaning processes during semiconductor manufacturing. It offers a faster response speed in a more compact size than anything available to date. The CS-131 monitors the concentrations of the individual components of the SC-1 solutions (NH3/H2O2/H2O) which is widely used to remove particles and organic substances. The monitor has a number of outputs which can be utilized to keep the concentrations of the individual elements of the SC-1 solutions within the allowable ranges; this eliminates unnecessary replacement of chemicals potentially increasing bath life time and reducing chemical cost. In addition, a model with an integrated cooling unit is available, allowing accommodation of a broader range of sample temperatures A measurement cycle of approx. 2 seconds supports concentration management for 300 mm processes. A very short measurement cycle* of approximately two seconds means fast response. Frequent feedback for both single-bath and batch type cleaning devices is supported. *Does not include chemical replacement and cooling times. The compact design of the CS-131, only two-thirds* of previous models allow for easy integration into your wafer cleaning system. *Compared to the CS-220 series. Fewer lot defects in the cleaning process means a higher yield Outputs from the monitor are used for replenishment control of the SC-1 solutions, enabling cleaning with a high reproducibility rate. There are fewer defects in the cleaning process, this helps boost the overall yield. Fully automated measurement for simplifies control. Measurement is fully automatic; no control is required once the system has been installed and measurement has begun. Air is used for reference spectral measurement removing the need of a utility water supply. Comprehensive counter measures to eliminate air bubbles enable the CS-131 to measure of high-temperature samples. Air bubbles are separated out in a bubble removing tank, while an electromagnetic valve minimizes mixing of air bubbles in the flow cell during measurement. If the monitor has an integrated cooling unit, high-temperature samples can be measured directly. Temperature compensation is carried out automatically. Low-voltage 24 V DC is used for the power supply, offering improved safety and protection from electrical shock. An internal leakage sensor can be installed to detect leaks; the supply of the SC-1 solutions can then be shut off in the event of an emergency.

The CS-131 is a high-precision chemical concentration monitor designed for use with SC-1 solutions used in cleaning processes during semiconductor manufacturing. It offers a faster response speed in a more compact size than anything available to date. The CS-131 monitors the concentrations of the individual components of the SC-1 solutions (NH3/H2O2/H2O) which is widely used to remove particles and organic substances. The monitor has a number of outputs which can be utilized to keep the concentrations of the individual elements of the SC-1 solutions within the allowable ranges; this eliminates unnecessary replacement of chemicals potentially increasing bath life time and reducing chemical cost. In addition, a model with an integrated cooling unit is available, allowing accommodation of a broader range of sample temperatures

A measurement cycle of approx. 2 seconds supports concentration management for 300 mm processes.
A very short measurement cycle* of approximately two seconds means fast response. Frequent feedback for both single-bath and batch type cleaning devices is supported.
*Does not include chemical replacement and cooling times.
The compact design of the CS-131, only two-thirds* of previous models allow for easy integration into your wafer cleaning system.
*Compared to the CS-220 series.
Fewer lot defects in the cleaning process means a higher yield
Outputs from the monitor are used for replenishment control of the SC-1 solutions, enabling cleaning with a high reproducibility rate. There are fewer defects in the cleaning process, this helps boost the overall yield.
Fully automated measurement for simplifies control.
Measurement is fully automatic; no control is required once the system has been installed and measurement has begun. Air is used for reference spectral measurement removing the need of a utility water supply.
Comprehensive counter measures to eliminate air bubbles enable the CS-131 to measure of high-temperature samples.
Air bubbles are separated out in a bubble removing tank, while an electromagnetic valve minimizes mixing of air bubbles in the flow cell during measurement. If the monitor has an integrated cooling unit, high-temperature samples can be measured directly. Temperature compensation is carried out automatically.
Low-voltage 24 V DC is used for the power supply, offering improved safety and protection from electrical shock. An internal leakage sensor can be installed to detect leaks; the supply of the SC-1 solutions can then be shut off in the event of an emergency.

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Technical Specifications

  HORIBA Instruments, Inc.
Product Category Semiconductor Wet Process Equipment
Product Number CS-131
Product Name SC-1 Solution Concentration Monitor
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