Edwards Vacuum Oxidation Unit Mistral

Description
Mistral is an electrically-heated hot air oxidation unit coupled with a proven three-stage wet scrubber and self-cleaning inlets. Mistral employs a patented hydrogen inject system and is capable of removing pyrophoric and acid gases) for semiconductor applications such as polysilicon and oxide deposition as well as the high fluorine flows from processes that employ remote nitrogen trifluoride (NF3) clean.
Description
Mistral is an electrically-heated hot air oxidation unit coupled with a proven three-stage wet scrubber and self-cleaning inlets. Mistral employs a patented hydrogen inject system and is capable of removing pyrophoric and acid gases) for semiconductor applications such as polysilicon and oxide deposition as well as the high fluorine flows from processes that employ remote nitrogen trifluoride (NF3) clean.

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Oxidation Unit - Mistral - Edwards Vacuum
Crawley, West Sussex, United Kingdom
Oxidation Unit
Mistral
Oxidation Unit Mistral
Mistral is an electrically-heated hot air oxidation unit coupled with a proven three-stage wet scrubber and self-cleaning inlets. Mistral employs a patented hydrogen inject system and is capable of removing pyrophoric and acid gases) for semiconductor applications such as polysilicon and oxide deposition as well as the high fluorine flows from processes that employ remote nitrogen trifluoride (NF3) clean.

Mistral is an electrically-heated hot air oxidation unit coupled with a proven three-stage wet scrubber and self-cleaning inlets. Mistral employs a patented hydrogen inject system and is capable of removing pyrophoric and acid gases) for semiconductor applications such as polysilicon and oxide deposition as well as the high fluorine flows from processes that employ remote nitrogen trifluoride (NF3) clean.

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Technical Specifications

  Edwards Vacuum
Product Category Thermal Oxidizers and Catalytic Oxidizers
Product Number Mistral
Product Name Oxidation Unit
Applications Semiconductor Applications
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