The FC-4400A represents our largest scale design lift off oriented evaporation and our ultimate high throughput platform. This system is designed to support the metallization of thirty 6 inch wafers per load via high capacity e-beam evaporation. The load locked, 44 inch x 44 inch x 28 inch product chamber can be pumped by as many as two dedicated, high throughput 16 inch cryogenic pumps. The dual-cryo pump option makes it possible to pump this large chamber in 15 minutes from atmosphere to pressures in the range of 10E-7. During wafer exchanges, the source chamber is maintained at high vacuum by the independent pumping of a dedicated 10 inch cryo pump.
| Edwards Vacuum | |
|---|---|
| Product Category | Thin Film Equipment |
| Product Number | FC-4400A |
| Product Name | Temescal |
| Process | Physical Vapor Deposition; Electron Beam Evaporation |
| Applications | Research / Surface Analysis |
| Materials Processed | Metal |
| Wafer / Part Size | 152 mm (6 inch) |
