MacDermid Alpha Electronics Solutions Acid Copper Electroplating for IC Substrates Systek ™ ETS Series

Description
Product Overview Systek ETS features: Fine line pattern plating down to 5/5 µm line/space High coplanarity of traces and pads with R-Values < 2 µm Excellent trace profile for controlled impedance Low-stress deposit exceeds IPC Class III standards for tensile strength and elongation eliminating concerns of warpage due to metallization
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Description
Product Overview Systek ETS features: Fine line pattern plating down to 5/5 µm line/space High coplanarity of traces and pads with R-Values < 2 µm Excellent trace profile for controlled impedance Low-stress deposit exceeds IPC Class III standards for tensile strength and elongation eliminating concerns of warpage due to metallization
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Suppliers

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Acid Copper Electroplating for IC Substrates - Systek ™ ETS Series - MacDermid Alpha Electronics Solutions
Waterbury, CT, United States
Acid Copper Electroplating for IC Substrates
Systek ™ ETS Series
Acid Copper Electroplating for IC Substrates Systek ™ ETS Series
Product Overview Systek ETS features: Fine line pattern plating down to 5/5 µm line/space High coplanarity of traces and pads with R-Values < 2 µm Excellent trace profile for controlled impedance Low-stress deposit exceeds IPC Class III standards for tensile strength and elongation eliminating concerns of warpage due to metallization

Product Overview

Systek ETS features:

  • Fine line pattern plating down to 5/5 µm line/space
  • High coplanarity of traces and pads with R-Values < 2 µm
  • Excellent trace profile for controlled impedance
  • Low-stress deposit exceeds IPC Class III standards for tensile strength and elongation eliminating concerns of warpage due to metallization
Supplier's Site

Technical Specifications

  MacDermid Alpha Electronics Solutions
Product Category Plating Chemicals and Anodizing Chemicals
Product Number Systek ™ ETS Series
Product Name Acid Copper Electroplating for IC Substrates
Chemical / Composition Copper Plating; Tin Plating
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