MacDermid Alpha Electronics Solutions Wafer Bumping Metallization solutions for Semiconductor Packaging MICROFAB ® CU1000

Description
Product Overview The MICROFAB CU1000 process is engineered for high-speed bump and pillar applications. The process delivers accurate bump height uniformity and bump shape control. The product is formulated, packaged, and quality controlled according to the needs of the semiconductor industry.
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Description
Product Overview The MICROFAB CU1000 process is engineered for high-speed bump and pillar applications. The process delivers accurate bump height uniformity and bump shape control. The product is formulated, packaged, and quality controlled according to the needs of the semiconductor industry.
Request a Quote

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Wafer Bumping Metallization solutions for Semiconductor Packaging - MICROFAB ® CU1000 - MacDermid Alpha Electronics Solutions
Waterbury, CT, United States
Wafer Bumping Metallization solutions for Semiconductor Packaging
MICROFAB ® CU1000
Wafer Bumping Metallization solutions for Semiconductor Packaging MICROFAB ® CU1000
Product Overview The MICROFAB CU1000 process is engineered for high-speed bump and pillar applications. The process delivers accurate bump height uniformity and bump shape control. The product is formulated, packaged, and quality controlled according to the needs of the semiconductor industry.

Product Overview

The MICROFAB CU1000 process is engineered for high-speed bump and pillar applications. The process delivers accurate bump height uniformity and bump shape control. The product is formulated, packaged, and quality controlled according to the needs of the semiconductor industry.

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Technical Specifications

  MacDermid Alpha Electronics Solutions
Product Category Plating Chemicals and Anodizing Chemicals
Product Number MICROFAB ® CU1000
Product Name Wafer Bumping Metallization solutions for Semiconductor Packaging
Chemical / Composition Copper Plating; Hard Nickel Plating; Tin Plating
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