ASML Optics Lithography System TWINSCAN XT:1950Hi

Description
The TWINSCAN XT:1950Hi Step-and-Scan system takes single-exposure water-based immersion lithography to its limits. Combining high-productivity with ultra low k1, this dual-stage immersion lithography tool is designed for volume production on 300-mm wafers at 38-nm resolution and beyond. Building on the successful in-line catadioptric lens design concept first employed in the XT:1700Fi, the XT:1950Hi has a numerical aperture (NA) of 1.35 – the highest in the industry. This compact and mechanically stable lens design has the same image orientation as purely refractive lens designs, ensuring full reticle compatibility with non-immersion systems as well as the XT:1700Fi. Additional control features improve lens stability and aberration control further. The illuminator features polarization at maximum throughput and extremely homogeneous pupil fill, making it perfectly adapted to ultra low-k1pupil shapes. Customized illumination modes for ultra low k1 and rotated structures can also be set. In addition to its polarization capabilities, the system comes equipped with an extended Ultra-k1 package comprising QUASAR XL, LithoGuide ILIAS, DoseMapper, Image Tuner, Reticle Shape Correction, CDFEC and Focus Spot Monitor.
  • Lithography System - TWINSCAN XT:1950Hi - ASML Optics
    ASML Optics
Description
The TWINSCAN XT:1950Hi Step-and-Scan system takes single-exposure water-based immersion lithography to its limits. Combining high-productivity with ultra low k1, this dual-stage immersion lithography tool is designed for volume production on 300-mm wafers at 38-nm resolution and beyond. Building on the successful in-line catadioptric lens design concept first employed in the XT:1700Fi, the XT:1950Hi has a numerical aperture (NA) of 1.35 – the highest in the industry. This compact and mechanically stable lens design has the same image orientation as purely refractive lens designs, ensuring full reticle compatibility with non-immersion systems as well as the XT:1700Fi. Additional control features improve lens stability and aberration control further. The illuminator features polarization at maximum throughput and extremely homogeneous pupil fill, making it perfectly adapted to ultra low-k1pupil shapes. Customized illumination modes for ultra low k1 and rotated structures can also be set. In addition to its polarization capabilities, the system comes equipped with an extended Ultra-k1 package comprising QUASAR XL, LithoGuide ILIAS, DoseMapper, Image Tuner, Reticle Shape Correction, CDFEC and Focus Spot Monitor.

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Lithography System - TWINSCAN XT:1950Hi - ASML Optics
ASML Optics
Wilton, CT, USA
Lithography System
TWINSCAN XT:1950Hi
Lithography System TWINSCAN XT:1950Hi
The TWINSCAN XT:1950Hi Step-and-Scan system takes single-exposure water-based immersion lithography to its limits. Combining high-productivity with ultra low k1, this dual-stage immersion lithography tool is designed for volume production on 300-mm wafers at 38-nm resolution and beyond. Building on the successful in-line catadioptric lens design concept first employed in the XT:1700Fi, the XT:1950Hi has a numerical aperture (NA) of 1.35 – the highest in the industry. This compact and mechanically stable lens design has the same image orientation as purely refractive lens designs, ensuring full reticle compatibility with non-immersion systems as well as the XT:1700Fi. Additional control features improve lens stability and aberration control further. The illuminator features polarization at maximum throughput and extremely homogeneous pupil fill, making it perfectly adapted to ultra low-k1pupil shapes. Customized illumination modes for ultra low k1 and rotated structures can also be set. In addition to its polarization capabilities, the system comes equipped with an extended Ultra-k1 package comprising QUASAR XL, LithoGuide ILIAS, DoseMapper, Image Tuner, Reticle Shape Correction, CDFEC and Focus Spot Monitor.

The TWINSCAN XT:1950Hi Step-and-Scan system takes single-exposure water-based immersion lithography to its limits. Combining high-productivity with ultra low k1, this dual-stage immersion lithography tool is designed for volume production on 300-mm wafers at 38-nm resolution and beyond.
Building on the successful in-line catadioptric lens design concept first employed in the XT:1700Fi, the XT:1950Hi has a numerical aperture (NA) of 1.35 – the highest in the industry. This compact and mechanically stable lens design has the same image orientation as purely refractive lens designs, ensuring full reticle compatibility with non-immersion systems as well as the XT:1700Fi. Additional control features improve lens stability and aberration control further.
The illuminator features polarization at maximum throughput and extremely homogeneous pupil fill, making it perfectly adapted to ultra low-k1pupil shapes. Customized illumination modes for ultra low k1 and rotated structures can also be set. In addition to its polarization capabilities, the system comes equipped with an extended Ultra-k1 package comprising QUASAR XL, LithoGuide ILIAS, DoseMapper, Image Tuner, Reticle Shape Correction, CDFEC and Focus Spot Monitor.

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Technical Specifications

  ASML Optics
Product Category Lithography Equipment
Product Number TWINSCAN XT:1950Hi
Product Name Lithography System
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