ASML Optics Lithography System PAS 5500/1150C

Description
The PAS 5500/1150C 193-nm Step-and-Scan system enables cost effective 90-nm ArF mass production. The PAS 5500/1150C is the solution for both 90-nm critical and non critical ArF layers. The PAS 5500/1150C can be configured with a number of options that enable low-k1 in manufacturing, extending application of the PAS 5500/1150C below 90-nm.
  • Lithography System - PAS 5500/1150C - ASML Optics
    ASML Optics
Description
The PAS 5500/1150C 193-nm Step-and-Scan system enables cost effective 90-nm ArF mass production. The PAS 5500/1150C is the solution for both 90-nm critical and non critical ArF layers. The PAS 5500/1150C can be configured with a number of options that enable low-k1 in manufacturing, extending application of the PAS 5500/1150C below 90-nm.

Suppliers

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Product
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Lithography System - PAS 5500/1150C - ASML Optics
ASML Optics
Wilton, CT, USA
Lithography System
PAS 5500/1150C
Lithography System PAS 5500/1150C
The PAS 5500/1150C 193-nm Step-and-Scan system enables cost effective 90-nm ArF mass production. The PAS 5500/1150C is the solution for both 90-nm critical and non critical ArF layers. The PAS 5500/1150C can be configured with a number of options that enable low-k1 in manufacturing, extending application of the PAS 5500/1150C below 90-nm.

The PAS 5500/1150C 193-nm Step-and-Scan system enables cost effective 90-nm ArF mass production.

The PAS 5500/1150C is the solution for both 90-nm critical and non critical ArF layers. The PAS 5500/1150C can be configured with a number of options that enable low-k1 in manufacturing, extending application of the PAS 5500/1150C below 90-nm.

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Technical Specifications

  ASML Optics
Product Category Lithography Equipment
Product Number PAS 5500/1150C
Product Name Lithography System
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