The PAS 5500/400D i-line Step-and-Scan system has a variable-NA (0.48 to 0.65) 4x projection lens, which, combined with ASML’s AERIAL Illuminator, provides 280-nm resolution. ASML’s revolutionary Step-and-Scan stage technology enables users to take full advantage of the AERIAL illumination intensity and advanced i-line resists for throughputs of 124 200-mm wph. Long-term production overlay is less than 30 nm. The PAS 5500/400D Step-and-Scan system’s resolution and productivity ensure the lowest operating cost for advanced i-line lithography.
| ASML Optics | |
|---|---|
| Product Category | Lithography Equipment |
| Product Number | PAS 5500/400D |
| Product Name | Lithography System |
