ASML Optics Lithography System PAS 5500/275D

Description
The PAS 5500/275D is an i-line stepper stretching resolution down to 0.28 μm and beyond. It is built on the success of the proven PAS 5500/250C advanced i-line stepper. The PAS 5500/275D features improved imaging achieved by applying the latest techniques in lens adjustment as well as improved overlay by including phase modulation in the system. In addition to that, Image Quality Control is included as standard. Leadership productivity is improved to more than 100 wph (ATP settings). The PAS 5500/275D uses an AERIAL illuminator, which provides flexible and automated NA/sigma combinations in both conventional and off-axis illumination modes while maintaining high intensities to enable economical mass production of leading-edge devices.
  • Lithography System - PAS 5500/275D - ASML Optics
    ASML Optics
Description
The PAS 5500/275D is an i-line stepper stretching resolution down to 0.28 μm and beyond. It is built on the success of the proven PAS 5500/250C advanced i-line stepper. The PAS 5500/275D features improved imaging achieved by applying the latest techniques in lens adjustment as well as improved overlay by including phase modulation in the system. In addition to that, Image Quality Control is included as standard. Leadership productivity is improved to more than 100 wph (ATP settings). The PAS 5500/275D uses an AERIAL illuminator, which provides flexible and automated NA/sigma combinations in both conventional and off-axis illumination modes while maintaining high intensities to enable economical mass production of leading-edge devices.

Suppliers

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Description
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Lithography System - PAS 5500/275D - ASML Optics
ASML Optics
Wilton, CT, USA
Lithography System
PAS 5500/275D
Lithography System PAS 5500/275D
The PAS 5500/275D is an i-line stepper stretching resolution down to 0.28 μm and beyond. It is built on the success of the proven PAS 5500/250C advanced i-line stepper. The PAS 5500/275D features improved imaging achieved by applying the latest techniques in lens adjustment as well as improved overlay by including phase modulation in the system. In addition to that, Image Quality Control is included as standard. Leadership productivity is improved to more than 100 wph (ATP settings). The PAS 5500/275D uses an AERIAL illuminator, which provides flexible and automated NA/sigma combinations in both conventional and off-axis illumination modes while maintaining high intensities to enable economical mass production of leading-edge devices.

The PAS 5500/275D is an i-line stepper stretching resolution down to 0.28 μm and beyond. It is built on the success of the proven PAS 5500/250C advanced i-line stepper.

The PAS 5500/275D features improved imaging achieved by applying the latest techniques in lens adjustment as well as improved overlay by including phase modulation in the system. In addition to that, Image Quality Control is included as standard. Leadership productivity is improved to more than 100 wph (ATP settings). The PAS 5500/275D uses an AERIAL illuminator, which provides flexible and automated NA/sigma combinations in both conventional and off-axis illumination modes while maintaining high intensities to enable economical mass production of leading-edge devices.

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Technical Specifications

  ASML Optics
Product Category Lithography Equipment
Product Number PAS 5500/275D
Product Name Lithography System
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