The TWINSCAN XT:1000H 248-nm Step-and-Scan system is a new dual-stage KrF lithography tool with the highest NA and productivity in the industry, designed for 200-mm and 300-mm wafer production. Combining the imaging power of the variable 0.93-NA Carl Zeiss Starlith 4X reduction lens with AERIAL-E illuminator technology, the XT:1000H extends volume-proven KrF technology to < 80-nm resolution. Extending critical KrF technology reduces customer’s cost per layer while benefiting from mature KrF processing. Highly line-narrowed 40-W KrF lasers with variable frequency control, in combination with the high optical transmission of the optical system, provide a production throughput of 165 300-mm wph with the lowest possible cost of operation. The XT:1000H is ideal for metal, via and implant layers at the 4X-nm technology node and beyond, both memory and logic applications. In addition, imaging matching to other TWINSCAN KrF systems and excellent overlay matching to TWINSCAN ArF and KrF systems is provided enabling seamless integration in a high volume manufacturing environment.
| ASML Optics | |
|---|---|
| Product Category | Lithography Equipment |
| Product Number | TWINSCAN XT:1000H |
| Product Name | Lithography System |
