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Xenon Corporation Rack-Mounted Sintering System S-2100

Description
The XENON S-2100 is the next generation in the S-2000 sintering systems, a rack-mounted, high-energy, Pulsed Light system designed for reliable, repeatable sintering of conductive nanoparticles on heat-sensitive materials for printed electronics. The system features a high intensity pulsed xenon lamp that provides a broadband spectrum, from 240nm to 1000nm with adjustable energy up to 2000 Joules/pulse. Selectable pulse duration: 100 to 2000µs. Adjustable pulse energy: 200 - 2000 Joules. UV Sintering area: 1.9 x 30.5cm. The S-2100 offers the flexibility to adjust both the energy delivered to the flashlamp and the pulse width. The pulse width can be adjusted to two different preset values, 1.5ms or 2.0ms, or adjusted over a range from 0.1ms to 1.0ms. The energy to the flashlamp can be controlled by setting the voltage on the system. This exceptional flexibility makes evaluating and deploying easy. The S-2100 delivers with a 16 inch linear lamp or with a 107mm spiral lamp, and can be configured with a number of available options. S-2100 Features Selectable pulse duration Adjustable pulse energy Single/Continuous/Bu rst/Double mode pulses Sintering area: 1.9 x 30.5 cm
Datasheet

Suppliers

Company
Product
Description
Supplier Links
Rack-Mounted Sintering System - S-2100 - Xenon Corporation
Wilmington, MA, USA
Rack-Mounted Sintering System
S-2100
Rack-Mounted Sintering System S-2100
The XENON S-2100 is the next generation in the S-2000 sintering systems, a rack-mounted, high-energy, Pulsed Light system designed for reliable, repeatable sintering of conductive nanoparticles on heat-sensitive materials for printed electronics. The system features a high intensity pulsed xenon lamp that provides a broadband spectrum, from 240nm to 1000nm with adjustable energy up to 2000 Joules/pulse. Selectable pulse duration: 100 to 2000µs. Adjustable pulse energy: 200 - 2000 Joules. UV Sintering area: 1.9 x 30.5cm. The S-2100 offers the flexibility to adjust both the energy delivered to the flashlamp and the pulse width. The pulse width can be adjusted to two different preset values, 1.5ms or 2.0ms, or adjusted over a range from 0.1ms to 1.0ms. The energy to the flashlamp can be controlled by setting the voltage on the system. This exceptional flexibility makes evaluating and deploying easy. The S-2100 delivers with a 16 inch linear lamp or with a 107mm spiral lamp, and can be configured with a number of available options. S-2100 Features Selectable pulse duration Adjustable pulse energy Single/Continuous/Bu rst/Double mode pulses Sintering area: 1.9 x 30.5 cm

The XENON S-2100 is the next generation in the S-2000 sintering systems, a rack-mounted, high-energy, Pulsed Light system designed for reliable, repeatable sintering of conductive nanoparticles on heat-sensitive materials for printed electronics.
The system features a high intensity pulsed xenon lamp that provides a broadband spectrum, from 240nm to 1000nm with adjustable energy up to 2000 Joules/pulse. Selectable pulse duration: 100 to 2000µs. Adjustable pulse energy: 200 - 2000 Joules. UV Sintering area: 1.9 x 30.5cm.
The S-2100 offers the flexibility to adjust both the energy delivered to the flashlamp and the pulse width. The pulse width can be adjusted to two different preset values, 1.5ms or 2.0ms, or adjusted over a range from 0.1ms to 1.0ms. The energy to the flashlamp can be controlled by setting the voltage on the system. This exceptional flexibility makes evaluating and deploying easy.
The S-2100 delivers with a 16 inch linear lamp or with a 107mm spiral lamp, and can be configured with a number of available options.

S-2100 Features

  • Selectable pulse duration
  • Adjustable pulse energy
  • Single/Continuous/Burst/Double mode pulses
  • Sintering area: 1.9 x 30.5 cm
Supplier's Site Datasheet

Technical Specifications

  Xenon Corporation
Product Category UV Light Systems
Product Number S-2100
Product Name Rack-Mounted Sintering System
Features Computer Interface or Programmable; Pulsed; Timer
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