Ushio America, Inc. Charge Neutralization System


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Charge Neutralization System -  - Ushio America, Inc.
Cypress, CA, USA
Charge Neutralization System
Strong, deep ultraviolet irradiation neutralizes electric charge on EPROM and Flash memory. Neutralizes electric charge that can be problematic for plasma processing. FEATURES & BENEFITS UV Charge Erasure Intense deep ultraviolet irradiation neutralizes electric charge on substrates. This system has been adopted in semiconductor manufacturing lines, with over 700 units delivered. High-Intensity Uniform Irradiation Guaranteed initial illuminance is 650 mW/cm2 (at 220 to 320 nm) with ±10% uniformity. Easy Lamp Unit Replacement System downtime is reduced because no adjustment is required when replacing the lamp unit. Extensive Product Lineup Supports all work cassettes including 6-inch systems (5-inch or less also available), 8-inch systems (6-inch or less also available), and 12-inch dedicated systems. An 8-inch system with an excimer lamp is also available. APPLICATIONS Charge neutralization (EPROM, OTP, Flash memory) Pre-deposition charge neutralization Charge neutralization to avoid plasma processing problems and more
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Technical Specifications

  Ushio America, Inc.
Product Category Thin Film Equipment
Product Name Charge Neutralization System
Type Free Standing System
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