Umicore Metal Deposition Solutions HfO2 99.9% 1.5-3.5mm 500g - 0707542-00500G 00500g

Description
Coating material Hafnium oxide Purity 99.9% Form Granulate Dimensions 1.5 - 3.5 mm Quantity 500 g Theoretical density at 20°C in g/cm³ 9.7 Melting point in °C 2733-2783 10⁻² mbar in °C 2500 10⁻¹ mbar in °C 2700 Boiling point in °C ~ 5400 Melting Good Sublimation Good W Possible Mo Good Preparation of base melt (premelt) Possible Reactive gas pressure Good 100 - 200 °C Good 200 - 300 °C Good Low 0.23 High ~ 8 at 550 nm: n 1.90-2.07
Description
Coating material Hafnium oxide Purity 99.9% Form Granulate Dimensions 1.5 - 3.5 mm Quantity 500 g Theoretical density at 20°C in g/cm³ 9.7 Melting point in °C 2733-2783 10⁻² mbar in °C 2500 10⁻¹ mbar in °C 2700 Boiling point in °C ~ 5400 Melting Good Sublimation Good W Possible Mo Good Preparation of base melt (premelt) Possible Reactive gas pressure Good 100 - 200 °C Good 200 - 300 °C Good Low 0.23 High ~ 8 at 550 nm: n 1.90-2.07

Suppliers

Company
Product
Description
Supplier Links
HfO2 99.9% 1.5-3.5mm 500g - 0707542-00500G - 00500g - Umicore Metal Deposition Solutions
Schwaebisch Gmuend, Germany
HfO2 99.9% 1.5-3.5mm 500g - 0707542-00500G
00500g
HfO2 99.9% 1.5-3.5mm 500g - 0707542-00500G 00500g
Coating material Hafnium oxide Purity 99.9% Form Granulate Dimensions 1.5 - 3.5 mm Quantity 500 g Theoretical density at 20°C in g/cm³ 9.7 Melting point in °C 2733-2783 10⁻² mbar in °C 2500 10⁻¹ mbar in °C 2700 Boiling point in °C ~ 5400 Melting Good Sublimation Good W Possible Mo Good Preparation of base melt (premelt) Possible Reactive gas pressure Good 100 - 200 °C Good 200 - 300 °C Good Low 0.23 High ~ 8 at 550 nm: n 1.90-2.07

Coating material

Hafnium oxide

Purity

99.9%

Form

Granulate

Dimensions

1.5 - 3.5 mm

Quantity

500 g

Theoretical density at 20°C in g/cm³

9.7

Melting point in °C

2733-2783

10⁻² mbar in °C

2500

10⁻¹ mbar in °C

2700

Boiling point in °C

~ 5400

Melting

Good

Sublimation

Good

W

Possible

Mo

Good

Preparation of base melt (premelt)

Possible

Reactive gas pressure

Good

100 - 200 °C

Good

200 - 300 °C

Good

Low

0.23

High

~ 8

at 550 nm: n

1.90-2.07

Supplier's Site

Technical Specifications

  Umicore Metal Deposition Solutions
Product Category Inorganic Chemicals and Compounds
Product Number 00500g
Product Name HfO2 99.9% 1.5-3.5mm 500g - 0707542-00500G
State of Matter Bulk Solids or Granules;

Granulate

Unlock Full Specs
to access all available technical data

Similar Products

pH Buffer 7.00 - 238188 - Hamilton Company
Hamilton Company
Specs
Type Other; Buffer
Chemical Name Potassium Dihydrogen Phosphate, di-Potassium Phosphate
Chemical Formula KH2PO4, K2HPO4
View Details
DIPHENYLMETHYLCHLOROSILANE - SID4552.0 - Gelest, Inc.
Specs
Chemical Formula C 1 3 H 1 3 ClSi
CAS Number 144-79-6
Flash Point 286 F (141 C)
View Details