The heat source combined with a high temperature insulation allow for high operating temperatures up to 2012°F/1100°C. Higher temperature ratings up to 2192°F/1200°C are available in limited designs.
Common Applications
Annealing of Glass
Crystal Growth, R & D
Heat Treatment and Tempering
Paint Curing
Plastics Industry Sealers & Formers
Removal of By-Products & Catalyst Materials
Semiconductor Diffusion Furnaces
Semiconductor Annealing Wafers
The heat source combined with a high temperature insulation allow for high operating temperatures up to 2012°F/1100°C. Higher temperature ratings up to 2192°F/1200°C are available in limited designs.
Common Applications
- Annealing of Glass
- Crystal Growth, R & D
- Heat Treatment and Tempering
- Paint Curing
- Plastics Industry Sealers & Formers
- Removal of By-Products & Catalyst Materials
- Semiconductor Diffusion Furnaces
- Semiconductor Annealing Wafers
