Technic, Inc. Real Time Analyzer RTA

Description
The RTA is an automated, on-line, real-time, and in-tank system for monitoring and controlling the levels of chemical constituents of plating baths. The RTA technology is a unique modern approach to metrology combining the advanced, purpose-selected electroanalytical techniques with state-of-the-art chemometric techniques. This patented analytical technique utilizes a combination of both AC and DC voltammetry to precisely measure both organic and inorganic levels. Plating performance becomes consistent yielding a constant optimum deposit. In-tank, real-time process control Accurately monitors inorganic and organic bath components Fast, accurate analysis (Approx. 15 min. for 6 components with early fault detection capability) Worldwide technical support Full closed-loop integration capability with major plating tools Virtually no maintenance with low cost of ownership Small footprint Simple installation RTA is the most advanced process control technology for copper electrodeposition available in today's market offering accurate analysis of commercial processes from Enthone OMI, Dow Chemicals, Technic, and others.
Description
The RTA is an automated, on-line, real-time, and in-tank system for monitoring and controlling the levels of chemical constituents of plating baths. The RTA technology is a unique modern approach to metrology combining the advanced, purpose-selected electroanalytical techniques with state-of-the-art chemometric techniques. This patented analytical technique utilizes a combination of both AC and DC voltammetry to precisely measure both organic and inorganic levels. Plating performance becomes consistent yielding a constant optimum deposit. In-tank, real-time process control Accurately monitors inorganic and organic bath components Fast, accurate analysis (Approx. 15 min. for 6 components with early fault detection capability) Worldwide technical support Full closed-loop integration capability with major plating tools Virtually no maintenance with low cost of ownership Small footprint Simple installation RTA is the most advanced process control technology for copper electrodeposition available in today's market offering accurate analysis of commercial processes from Enthone OMI, Dow Chemicals, Technic, and others.

Suppliers

Company
Product
Description
Supplier Links
Real Time Analyzer - RTA - Technic, Inc.
Cranston, RI, USA
Real Time Analyzer
RTA
Real Time Analyzer RTA
The RTA is an automated, on-line, real-time, and in-tank system for monitoring and controlling the levels of chemical constituents of plating baths. The RTA technology is a unique modern approach to metrology combining the advanced, purpose-selected electroanalytical techniques with state-of-the-art chemometric techniques. This patented analytical technique utilizes a combination of both AC and DC voltammetry to precisely measure both organic and inorganic levels. Plating performance becomes consistent yielding a constant optimum deposit. In-tank, real-time process control Accurately monitors inorganic and organic bath components Fast, accurate analysis (Approx. 15 min. for 6 components with early fault detection capability) Worldwide technical support Full closed-loop integration capability with major plating tools Virtually no maintenance with low cost of ownership Small footprint Simple installation RTA is the most advanced process control technology for copper electrodeposition available in today's market offering accurate analysis of commercial processes from Enthone OMI, Dow Chemicals, Technic, and others.

The RTA is an automated, on-line, real-time, and in-tank system for monitoring and controlling the levels of chemical constituents of plating baths.

The RTA technology is a unique modern approach to metrology combining the advanced, purpose-selected electroanalytical techniques with state-of-the-art chemometric techniques. This patented analytical technique utilizes a combination of both AC and DC voltammetry to precisely measure both organic and inorganic levels. Plating performance becomes consistent yielding a constant optimum deposit.

  • In-tank, real-time process control
  • Accurately monitors inorganic and organic bath components
  • Fast, accurate analysis (Approx. 15 min. for 6 components with early fault detection capability)
  • Worldwide technical support
  • Full closed-loop integration capability with major plating tools
  • Virtually no maintenance with low cost of ownership
  • Small footprint
  • Simple installation

RTA is the most advanced process control technology for copper electrodeposition available in today's market offering accurate analysis of commercial processes from Enthone OMI, Dow Chemicals, Technic, and others.

Supplier's Site

Technical Specifications

  Technic, Inc.
Product Category Wafer and Thin Film Instrumentation
Product Number RTA
Product Name Real Time Analyzer
Form Factor Monitor or instrument
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