SPIE - Education Spatial Coherence and Impact on Lithography Simulation and OPC SC1172

This course explores the fundamentals and stochastics of image formation used in traditional optical lithography modelling - from the standpoint of Spatial Coherence. The subject will be broken down to first principals, uncovering both strengths and weaknesses of conventional descriptions. This will be followed by explanations of concepts in simple terms, allowing for the understanding of the various impacts of Spatial Coherence necessary for the foundation of image modelling. The course will include an overview of coherence theory, a review of fundamental diffraction physics, and a description of the origin and meaning of the parameters used. Attendees will gain the fundamental understanding of the illumination and image creation and how this is impacted by the properties of the illumination system. Students will learn the various approaches to optical modelling, where optical proximity effect (OPE) calculations will be covered in detail as a practical application. Attendees will gain an understanding of the tradeoffs and interplay between optical conditions, and how maximize the benefits of the any optimization approach. Once optical modelling foundations are established, the course will cover the balance and interaction between image parameters. A unique approach to source optimization will be described which optimizes the relationship between the source, OPC modelling accuracy, and overall process window. The course will review the key impacts from the perspective of parameters such as spatial coherence, optical proximity impact, illumination, process window, and OPC modelling accuracy. The audience will be left with the practical understanding necessary to fully optimize the optical conditions necessary for cutting edge optical lithography.