Scatterometry is an optical method to measure profile characteristics of repetitive features printed on a wafer. These profile characteristics are related to process control parameters for monitoring and control applications. This course explains the basic principles of scatterometry, including HW, measurements methodologies and algorithms. Multiple examples of scatterometry application for process monitoring and control in R&D and high volume semiconductor manufacturing are discussed. A primary goal of the course is to reveal the capabilities and limitations of scatterometry and the consequences for the application space.This course explains the basic principles of scatterometry and its application for process monitoring and control in high volume semiconductor manufacturing. A primary goal of the course is to reveal the capabilities and limitations of scatterometry and the consequences for the application space.
| SPIE - Education | |
|---|---|
| Product Category | Technical Courses and Programs |
| Product Number | SC1100 |
| Product Name | Scatterometry in Profile, Overlay and Focus Process Control |
| Type | Course |
