This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future.
Burn Lin is editor-in-chief of the Journal of Micro/Nanolithograph
y, MEMS, and MOEMS (JM3), past chair of the SPIE Advanced Lithography symposium, author of two book chapters and over 88 articles, and holder of 51 U.S. patents. He is a National Academy of Engineering member, SPIE fellow, and IEEE fellow.
This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future.
Burn Lin is editor-in-chief of the Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3), past chair of the SPIE Advanced Lithography symposium, author of two book chapters and over 88 articles, and holder of 51 U.S. patents. He is a National Academy of Engineering member, SPIE fellow, and IEEE fellow.
