Polytec, Inc. Optical Surface Profilometry TMS-320

Description
Designed as a compact, industrial inspection system, the TopMap In.Line interferometer easily installs on a manufacturing line and rapidly verifies production part specifications for flatness and topography. Surface heights (z-axis) of 40 nanometers or better can be resolved in the images. Available sample areas range from a rectangular 4.2 mm x 5.5 mm to a circular diameter of 19 mm.
Description
Designed as a compact, industrial inspection system, the TopMap In.Line interferometer easily installs on a manufacturing line and rapidly verifies production part specifications for flatness and topography. Surface heights (z-axis) of 40 nanometers or better can be resolved in the images. Available sample areas range from a rectangular 4.2 mm x 5.5 mm to a circular diameter of 19 mm.

Suppliers

Company
Product
Description
Supplier Links
Optical Surface Profilometry - TMS-320 - Polytec, Inc.
Irvine, CA, USA
Optical Surface Profilometry
TMS-320
Optical Surface Profilometry TMS-320
Designed as a compact, industrial inspection system, the TopMap In.Line interferometer easily installs on a manufacturing line and rapidly verifies production part specifications for flatness and topography. Surface heights (z-axis) of 40 nanometers or better can be resolved in the images. Available sample areas range from a rectangular 4.2 mm x 5.5 mm to a circular diameter of 19 mm.

Designed as a compact, industrial inspection system, the TopMap In.Line interferometer easily installs on a manufacturing line and rapidly verifies production part specifications for flatness and topography. Surface heights (z-axis) of 40 nanometers or better can be resolved in the images. Available sample areas range from a rectangular 4.2 mm x 5.5 mm to a circular diameter of 19 mm.

Technical Specifications

  Polytec, Inc.
Product Category Surface Metrology Equipment
Product Number TMS-320
Product Name Optical Surface Profilometry
Measurement Capability Area or three dimensional profile; Flatness; Parallelism; Roundness
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