Park Systems, Inc. XE-LCD

Description
Atomic Force Microscopy (AFM) is emerging as an essential tool in many industries. With its ability to accurately measure critical dimensions in the micrometer to nanometer regime, the AFM is becoming an essential tool choice in applications involving surface roughness, trench width, depth, sidewall slope, and line width characterization. The completely automated XE-LCD is designed for characterization of flat panel displays as either an in-line or off-line inspection tool. • Automatic Non-Contact AFM measurement • Automatic navigation and focusing • Automatic glass handling • Automatic data analysis • Glass size up to 2400 mm x 2100 mm • Automatic tip exchange (Optional) The XE-LCD is a completely automated AFM/SPM system for in-line characterization of flat panel displays.
Datasheet
Description
Atomic Force Microscopy (AFM) is emerging as an essential tool in many industries. With its ability to accurately measure critical dimensions in the micrometer to nanometer regime, the AFM is becoming an essential tool choice in applications involving surface roughness, trench width, depth, sidewall slope, and line width characterization. The completely automated XE-LCD is designed for characterization of flat panel displays as either an in-line or off-line inspection tool. • Automatic Non-Contact AFM measurement • Automatic navigation and focusing • Automatic glass handling • Automatic data analysis • Glass size up to 2400 mm x 2100 mm • Automatic tip exchange (Optional) The XE-LCD is a completely automated AFM/SPM system for in-line characterization of flat panel displays.
Datasheet

Suppliers

Company
Product
Description
Supplier Links
XE-LCD -  - Park Systems, Inc.
Santa Clara, CA, United States
XE-LCD
XE-LCD
Atomic Force Microscopy (AFM) is emerging as an essential tool in many industries. With its ability to accurately measure critical dimensions in the micrometer to nanometer regime, the AFM is becoming an essential tool choice in applications involving surface roughness, trench width, depth, sidewall slope, and line width characterization. The completely automated XE-LCD is designed for characterization of flat panel displays as either an in-line or off-line inspection tool. • Automatic Non-Contact AFM measurement • Automatic navigation and focusing • Automatic glass handling • Automatic data analysis • Glass size up to 2400 mm x 2100 mm • Automatic tip exchange (Optional) The XE-LCD is a completely automated AFM/SPM system for in-line characterization of flat panel displays.

Atomic Force Microscopy (AFM) is emerging as an essential tool in many industries. With its ability to accurately measure critical dimensions in the micrometer to nanometer regime, the AFM is becoming an essential tool choice in applications involving surface roughness, trench width, depth, sidewall slope, and line width characterization. The completely automated XE-LCD is designed for characterization of flat panel displays as either an in-line or off-line inspection tool.

• Automatic Non-Contact AFM measurement
• Automatic navigation and focusing
• Automatic glass handling
• Automatic data analysis
• Glass size up to 2400 mm x 2100 mm
• Automatic tip exchange (Optional)

The XE-LCD is a completely automated AFM/SPM system for in-line characterization of flat panel displays.

Datasheet

Technical Specifications

  Park Systems, Inc.
Product Category Wafer and Thin Film Instrumentation
Product Name XE-LCD
Form Factor Monitor or instrument
Mounting / Loading Floor
Technology Profilometer or AFM
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