Park Systems, Inc. XE-200

The XE-200 is an AFM with increased capacity that supports 200 mm wafer investigation. In addition to the precise scan performance provided by True Non-Contact mode, the XE-200 offers users an encoded XY stage that travels over the entire 200 mm x 200 mm sample area, an XY scan range of 100 µm x 100 µm, and a Z scan range of up to 25 µm. Also, the Step-and-Scan automated sample measurement greatly minimize the user’s required participation during system operation. Artifact Free Imaging by Crosstalk Elimination • Two independent, closed-loop XY and Z flexure scanners for sample and tip • Flat and linear XY scan of 100 μm x 100 μm with low residual bow • Out of plane motion of less than 2 nm over entire scan range • Up to 25 μm Z-scan by high force scanner • Accurate height measurements Ultimate AFM Resolution by True Non-Contact Mode • 10 times larger Z-scan bandwidth than a piezotube • Less tip wear for prolonged high-quality and high-resolution imaging • Minimized sample damage or modification • Immunity from parameter-dependent results observed in tapping imaging User Convenience by EZ Design • Open side access for easy sample or tip exchange • Dovetail-lock mount for easy head removal • Direct on-axis optics for high resolution optical viewing • Motorized optics stage Extended Option Compatibility with Modular Platform • Full SPM modes and options • Open side access for optical coupling • Automated sample measurements with motorized sample stage • Full travel range over 200 mm wafer