Park Systems, Inc. XE-100

The XE-100 is our flagship AFM with reduced drift rate and the Step-and-Scan Automation that provides the ultimate AFM/SPM performance in Non-Contact nanoscale metrology. It is a mid-priced system for materials science, polymers, electrochemistry and other applications in nanoscience and engineering. It can adopt a wide range of optical coupling with its open side access.Supports all XE modes and options Artifact Free Imaging by Crosstalk Elimination • Two independent, closed- loop XY and Z flexure scanners for sample and tip • Out of plane motion of less than 2 nm over entire scan range • Flat and linear XY scan of up to 100 μm x 100 μm with low residual bow • Up to 25 μm Z-scan by high force scanner • Accurate height measurements • Reduced drift rate of less than 0.5 nm/min Ultimate AFM Resolution by True Non-Contact Mode • 10 times larger Z-scan bandwidth than a piezotube • Less tip wear for prolonged high-quality and high-resolution imaging • Minimized sample damage or modification • Immunity from parameter-dependent results observed in tapping imaging User Convenience by EZ Design • Wide open access to the tip and sample • Snap tip exchange & EZ Laser beam alignment • Dovetail-lock mount for easy head removal • Direct on-axis optics for high resolution optical viewing • Motorized optics stage Full Option Compatibility with Modular Platform • Full SPM modes and options • Open side access for optical coupling • Motorized sample stage with Step-and-Scan automated measurements